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E I. du Pont de Nemours and Company ( Wilmington, DE )
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The present invention relates to various embodiments for a flushing system for an ink jet printer, wherein a flushing fluid source provides a flushing fluid to a manifold wherein the flushing fluid is introduced into the printer's lines, and capping device as well as past the print heads, wherein residual ink is reduced or removed.
Fluorinated polymers, photoresists and associated processes for microlithography are described. These polymers and photoresists are comprised of a fluoroalcohol functional group which simultaneously imparts high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm, which makes them highly useful for lithography at these short wavelengths.
An acid-dyeable polymer composition comprising (a) polymer and (b) polymeric additive comprising repeating units having the formula: ##STR1## or salts thereof, wherein A, B and Q, which may be the same or different, are selected from aliphatic or aromatic substituents provided that at least four carbon atoms separate any two nitrogen groups, R is an aliphatic or aromatic group, a is 1 to 5, and n is 3 to about 1,000. In addition, an acid-dyed composition prepared from the composition, a process of acid dyeing the composition and a process for preparing the composition.
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