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Film formation apparatus and method of using the same
US7604010
-
Oct 20, 2009
Method and apparatus for integrating metrology with etch processing
US7601272
-
Oct 13, 2009
Monitoring the reduction in thickness as material is removed from a wafer composite and test structure for monitoring removal of material
US7598098
-
Oct 06, 2009
Apparatus and method for use of optical system with a plasma processing system
US7591923
-
Sep 22, 2009
Method for finishing surface of preliminary polished glass substrate
US20090233192
-
Sep 17, 2009
Advanced process sensing and control using near infrared spectral reflectometry
US20090218314
-
Sep 03, 2009
Template pillar formation
US20090200266
-
Aug 13, 2009
Method and apparatus for identifying the chemical composition of a gas
US20090180113
-
Jul 16, 2009
Plasma etching apparatus and plasma etching method
US20090152241
-
Jun 18, 2009
Semiconductor-processing apparatus provided with self-cleaning device
US7534469
-
May 19, 2009
Method of making diamond product and diamond product
US7534360
-
May 19, 2009
Measuring etching rates using low coherence interferometry
US20090065478
-
Mar 12, 2009
Plasma processing apparatus and method of plasma distribution correction
US20090026170
-
Jan 29, 2009
Etch amount detection method, etching method, and etching system
US7481944
-
Jan 27, 2009
Endpoint detection for photomask etching
US20090014409
-
Jan 15, 2009
Method for processing semiconductor
US7473332
-
Jan 06, 2009
Plasma processing apparatus and plasma processing method
US20090001052
-
Jan 01, 2009
Miniature optically transparent window
US20080296257
-
Dec 04, 2008
Detailed grey scale inspection method and apparatus
US7457454
-
Nov 25, 2008
Emission spectroscopic processing apparatus and plasma processing method using it
US7455790
-
Nov 25, 2008
Monitoring etching of a substrate in an etch chamber
US20080272089
-
Nov 06, 2008
Reliable gap-filling process and apparatus for performing the process in the manufacturing of semiconductor devices
US7446367
-
Nov 04, 2008
Endpoint detection for photomask etching
US20080261335
-
Oct 23, 2008
Tungsten silicide etch process with reduced etch rate micro-loading
US7413992
-
Aug 19, 2008
Endpoint detection for photomask etching
US20080176149
-
Jul 24, 2008
Plasma state monitoring to control etching processes and across-wafer uniformity, and system for performing same
US7402257
-
Jul 22, 2008
Method for controlling a recess etch process
US7399711
-
Jul 15, 2008
Etching method of organic insulating film
US7396481
-
Jul 08, 2008
Thin-film magnetic recording head manufacture using selective imaging
US7378003
-
May 27, 2008
Method and apparatus for detecting end point
US7377992
-
May 27, 2008
Endpoint detection for photomask etching
US20080099436
-
May 01, 2008
Endpoint detection for photomask etching
US20080099435
-
May 01, 2008
Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside
US20080099434
-
May 01, 2008
Method of detecting etching end-point
US7361286
-
Apr 22, 2008
Method of producing a reflecting surface inside a substrate
US20080083699
-
Apr 10, 2008
Method and system for processing multi-layer films
US7354524
-
Apr 08, 2008
Etching apparatus and etching method using the same
US20080061034
-
Mar 13, 2008
Method and device for measuring wafer potential or temperature
US7335315
-
Feb 26, 2008
Method and apparatus for fabricating or altering microstructures using local chemical alterations
US7329361
-
Feb 12, 2008
Critical dimension control in a semiconductor fabrication process
US7306746
-
Dec 11, 2007
Electron induced chemical etching for materials characterization
US20070278180
-
Dec 06, 2007
Method for forming contact hole on semiconductor device
US20070272656
-
Nov 29, 2007
Method and apparatus for the treatment of a semiconductor wafer
US20070267142
-
Nov 22, 2007
Method and apparatus for detecting endpoint
US7297560
-
Nov 20, 2007
Method and apparatus for endpoint detection using partial least squares
US7297287
-
Nov 20, 2007
Method for stabilizing etching performance
US7279114
-
Oct 09, 2007
Processes for monitoring the levels of oxygen and/or nitrogen species in a substantially oxygen and nitrogen-free plasma ashing process
US20070221620
-
Sep 27, 2007
Method and system for high-speed, precise, laser-based modification of one or more electrical elements
US20070215575
-
Sep 20, 2007
Prediction method and apparatus for substrate processing apparatus
US20070215574
-
Sep 20, 2007
Pattern forming method and phase shift mask manufacturing method
US20070187361
-
Aug 16, 2007
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Method and apparatus (16)
Processing (15)
Etching method (9)
Substrate (4)
Endpoint-detection-for-photomask-etching - endpoint detection FOR photomask etching (5)
Monitoring (4)
Method and system (4)
Wafer (3)
Films (3)
Semiconductor device (2)
Elements (2)
Materials (2)
Mask (2)
Forming (2)
Formation (2)
Etching rate (2)