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current-us-classification:257/E21.218
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Methods of forming a layer for barrier applications in an interconnect structure
US7618893
-
Nov 17, 2009
Field effect transistors with dielectric source drain halo regions and reduced miller capacitance
US7618853
-
Nov 17, 2009
Detection of arcing events in wafer plasma processing through monitoring of trace gas concentrations
US20090280581
-
Nov 12, 2009
Methods for etching carbon nano-tube films for use in non-volatile memories
US20090278112
-
Nov 12, 2009
Method for manufacturing soi substrate
US7615456
-
Nov 10, 2009
Plasma processing method and computer readable storage medium
US20090275207
-
Nov 05, 2009
Cmos-compatible bulk-micromachining process for single-crystal mems/nems devices
US20090275162
-
Nov 05, 2009
Semiconductor device
US7608545
-
Oct 27, 2009
Passive elements, articles, packages, semiconductor composites, and methods of manufacturing same
US7605092
-
Oct 20, 2009
Methods for fabricating device features having small dimensions
US7601645
-
Oct 13, 2009
Method and apparatus for plasma processing
US7601619
-
Oct 13, 2009
Method for manufacturing semiconductor device
US7601601
-
Oct 13, 2009
Plasma composition for selective high-k etch
US7598184
-
Oct 06, 2009
Slot machine having feature in setting sequence in which symbols are rearranged on defined areas to specific sequence pattern and control method of the slot machine
US20090247269
-
Oct 01, 2009
Gaming machine
US20090247268
-
Oct 01, 2009
Bonus with proximity of occurrence related to base game outcomes or payback percentage
US20090247267
-
Oct 01, 2009
Slot machine enabling player to easily recognize gap from another player in terms required bet amount in game, and playing method thereof
US20090247265
-
Oct 01, 2009
Multi-solution bone cements and methods of making the same
US20090239970
-
Sep 24, 2009
Plasma etchimg method and plasma etching apparatus
US20090233450
-
Sep 17, 2009
Plasma etching method
US20090233446
-
Sep 17, 2009
Led with substrate modifications for enhanced light extraction and method of making same
US20090233394
-
Sep 17, 2009
Photoresist strip method for low-k dielectrics
US7585777
-
Sep 08, 2009
Etch rate and critical dimension uniformity by selection of focus ring material
US20090221150
-
Sep 03, 2009
Plasma etching method, plasma etching apparatus and computer-readable storage medium
US20090221148
-
Sep 03, 2009
Plasma processing apparatus and plasma processing method
US20090215274
-
Aug 27, 2009
Substrate processing method
US20090209108
-
Aug 20, 2009
Methods and apparatus for wafer area pressure control in an adjustable gap plasma chamber
US20090204342
-
Aug 13, 2009
Plasma etching method, plasma etching apparatus and computer-readable storage medium
US20090203219
-
Aug 13, 2009
Plasma etching method and computer-readable storage medium
US20090203218
-
Aug 13, 2009
Substrate processing method and substrate processing apparatus
US20090197423
-
Aug 06, 2009
Process for removing high stressed film using lf or hf bias power and capacitively coupled vhf source power with enhanced residue capture
US20090197419
-
Aug 06, 2009
Substrate processing apparatus
US20090197418
-
Aug 06, 2009
Method of etching amorphous silicon layer and method of manufacturing liquid crystal display using the same
US20090191655
-
Jul 30, 2009
Selective etching of mems using gaseous halides and reactive co-etchants
US7566664
-
Jul 28, 2009
Boron doped shell for mems device
US7563720
-
Jul 21, 2009
Dual damascene process
US7563719
-
Jul 21, 2009
Dry-etching method and apparatus
US20090181545
-
Jul 16, 2009
Method of forming bonding pad opening
US20090181542
-
Jul 16, 2009
Method of manufacturing nonvolatile semiconductor memory device
US7560386
-
Jul 14, 2009
Method of etching a high aspect ratio contact
US20090176375
-
Jul 09, 2009
Pattern forming method, semiconductor device manufacturing apparatus and storage medium
US20090176374
-
Jul 09, 2009
Method for fabrication of floating gate in semiconductor device
US20090176320
-
Jul 09, 2009
Systems and methods for interconnect metallization using a stop-etch layer
US7557046
-
Jul 07, 2009
Method of etching a dielectric layer to form a contact hole and a via hole and damascene method
US7557025
-
Jul 07, 2009
Method for producing a solar cell
US7556741
-
Jul 07, 2009
Plasma etching method, plasma etching apparatus, control program and computer-readable storage medium
US20090170335
-
Jul 02, 2009
Copper discoloration prevention following bevel etch process
US20090170334
-
Jul 02, 2009
Shallow trench isolation etch process
US20090170333
-
Jul 02, 2009
Method of forming a bottle-shaped trench by ion implantation
US20090170331
-
Jul 02, 2009
Etch with high etch rate resist mask
US20090163035
-
Jun 25, 2009
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Current-status (17)
Process (12)
Plasma (12)
Method AND apparatus (10)
Method OF manufacturing (6)
Semiconductor device (5)
Method OF forming (5)
Slot machine (2)
Dimension (2)
Wafer (2)
Area (2)
Game (2)
GAP (2)
Memory (2)
Trench (2)
Pattern (2)
Film (2)
Etch rate (2)
Method OF making (2)