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US Patents
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Method for monitoring focus on an integrated wafer
US20090284722
-
Nov 19, 2009
Method for performing a focus test and a device manufacturing method
US7619717
-
Nov 17, 2009
Immersion exposure technique
US7619714
-
Nov 17, 2009
Method and system for automatically detecting exposed substrates having a high probability for defocused exposure fields
US7618755
-
Nov 17, 2009
Scanning exposure apparatus and method of manufacturing device
US20090274983
-
Nov 05, 2009
Method and lithographic apparatus for acquiring height data relating to a substrate surface
US20090262320
-
Oct 22, 2009
Position measurement system and lithographic apparatus
US7599043
-
Oct 06, 2009
Methods of heat-treating soda-lime glass substrates and heat-treated soda-lime glass substrates formed using the same
US20090239733
-
Sep 24, 2009
Optical system and method of use
US20090231565
-
Sep 17, 2009
Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus
US7589818
-
Sep 15, 2009
Reduction of fit error due to non-uniform sample distribution
US7583359
-
Sep 01, 2009
Exposure apparatus and method for manufacturing device
US7580114
-
Aug 25, 2009
Method of reducing a wave front aberration, and computer program product
US7580113
-
Aug 25, 2009
Projection lens unit with focus and level control, related exposure apparatus and method
US20090195765
-
Aug 06, 2009
Exposure apparatus and device manufacturing method
US7570344
-
Aug 04, 2009
Lithographic apparatus and device manufacturing method
US7567340
-
Jul 28, 2009
Best focus detection method, exposure method, and exposure apparatus
US7566893
-
Jul 28, 2009
Polarization evaluation mask, polarization evaluation method, and polarization determination device
US7564553
-
Jul 21, 2009
Seamless exposure with projection system comprises array of micromirrors with predefined reflectivity variations
US7564535
-
Jul 21, 2009
Contrast based resolution enhancement for photolithographic processing
US7562336
-
Jul 14, 2009
Method for a multiple exposure, microlithography projection exposure installation and a projection system
US7561253
-
Jul 14, 2009
Immersion exposure technique
US7561248
-
Jul 14, 2009
Method of manufacturing master plate, method of manufacturing microneedle patch and apparatus exposure apparatus
US20090162798
-
Jun 25, 2009
Ion beam irradiating apparatus and method of adjusting uniformity of a beam
US7541601
-
Jun 02, 2009
Lithographic apparatus and methods for use thereof
US7538875
-
May 26, 2009
Photolithographic systems and methods for producing sub-diffraction-limited features
US7538858
-
May 26, 2009
Measuring apparatus and exposure apparatus having the same
US7538854
-
May 26, 2009
Projection lens unit with focus and level control, related exposure apparatus and method
US7535551
-
May 19, 2009
Method and system for focusing a charged particle beam
US7535001
-
May 19, 2009
Lithographic apparatus and device manufacturing method
US7534552
-
May 19, 2009
Position detector, position detection method, exposure apparatus, and method of manufacturing device
US20090115985
-
May 07, 2009
Lithographic apparatus and device manufacturing method
US7528934
-
May 05, 2009
Lithographic apparatus and device manufacturing method
US7528931
-
May 05, 2009
Charged particle beam processing apparatus
US7528393
-
May 05, 2009
Exposure apparatus and method, and device manufacturing method using the same
US7525639
-
Apr 28, 2009
Lithographic apparatus and device manufacturing method
US7525638
-
Apr 28, 2009
Exposure apparatus and method for photolithography process
US20090103068
-
Apr 23, 2009
Lithographic apparatus and device manufacturing method
US7522266
-
Apr 21, 2009
Exposure apparatus, a tilting device method for performing a tilted focus test, and a device manufactured accordingly
US7518706
-
Apr 14, 2009
Exposure apparatus and method of manufacturing device
US20090081568
-
Mar 26, 2009
Exposure system and method of manufacturing a semiconductor device
US20090073409
-
Mar 19, 2009
Multiple exposure method
US7505112
-
Mar 17, 2009
Exposure apparatus
US7502098
-
Mar 10, 2009
Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly
US7502097
-
Mar 10, 2009
Exposure method that obtains, prior to exposure, reticle surface form data and measurement position error, for scanning control
US7498596
-
Mar 03, 2009
Method and apparatus for controlling etch processes during fabrication of semiconductor devices
US7498106
-
Mar 03, 2009
Adjustable resolution interferometric lithography system
US7492442
-
Feb 17, 2009
Position sensor
US20090040489
-
Feb 12, 2009
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US20090040488
-
Feb 12, 2009
System and method for projecting a pattern from a mask onto a substrate
US7489386
-
Feb 10, 2009
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Cluster
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Exposure method (19)
Apparatus AND device manufacturing method (16)
System and method (8)
Focus (7)
Position (4)
Processes (4)
Substrate (4)
Charged particle beam (2)
Form (2)
Error (2)
Resolution (2)
Immersion-exposure-technique - immersion exposure technique (2)
Mask (2)
Data - surface (2)
Detection method (2)
Semiconductor devices (2)
Projection system (2)