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Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus

US7619738 - Nov 17, 2009

Method of measurement, an inspection apparatus and a lithographic apparatus

US7619737 - Nov 17, 2009

Apparatus and methods for detecting overlay errors using scatterometry

US7616313 - Nov 10, 2009

Optical gratings, lithography tools including such optical gratings and methods for using same for alignment

US7612882 - Nov 03, 2009

Method of alignment of an optical module and an optical module using thereof

US7612881 - Nov 03, 2009

Method of aligning an exposure apparatus, method of exposing a photoresist film using the same and exposure apparatus for performing the method of exposing a photoresist film

US20090268179 - Oct 29, 2009

Apparatus and methods for determining overlay and uses of same

US7608468 - Oct 27, 2009

Measuring method, adjustment method for stage movement characteristics, exposure method, and device manufacturing method

US20090257045 - Oct 15, 2009

Alignment apparatus for aligning multi-layer structures

US20090257036 - Oct 15, 2009

Overlay measuring method and related semiconductor fabrication equipment management system

US7602492 - Oct 13, 2009

Optical gain approach for enhancement of overlay and alignment systems performance

US7602491 - Oct 13, 2009

Apparatus and method for semiconductor wafer alignment

US20090251699 - Oct 08, 2009

Method and system for collecting alignment data from coated chips or wafers

US20090251698 - Oct 08, 2009

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method, substrate for use in the methods

US7599064 - Oct 06, 2009

Method for checking alignment accuracy using overlay mark

US7599063 - Oct 06, 2009

Holding apparatus, position detection apparatus and exposure apparatus, moving method, position detection method, exposure method, adjustment method of detection system and device manufacturing method

US20090233234 - Sep 17, 2009

Periodic patterns and technique to control misaligment between two layers

US20090231584 - Sep 17, 2009

Method and apparatus for aligning a substrate and for inspecting a pattern on a substrate

US20090226078 - Sep 10, 2009

Reticle for projection exposure apparatus and exposure method using the same

US20090225294 - Sep 10, 2009

Method for analyzing overlay errors

US7586609 - Sep 08, 2009

Wafer-level testing of optical and optoelectronic chips

US7586608 - Sep 08, 2009

Exposure method, exposure apparatus, and method of manufacturing device

US20090219533 - Sep 03, 2009

Measurement method and measurement reticle

US20090213388 - Aug 27, 2009

Angularly resolved scatterometer and inspection method

US7580131 - Aug 25, 2009

Exposure apparatus and device manufacturing method

US20090208855 - Aug 20, 2009

Lithographic method

US20090207399 - Aug 20, 2009

Alignment apparatus and alignment method

US7576859 - Aug 18, 2009

Position detecting method

US7576858 - Aug 18, 2009

Method and apparatus for angular-resolved spectroscopic lithography characterization

US7573584 - Aug 11, 2009

Optical position measuring system and method using a low coherence light source

US7573580 - Aug 11, 2009

Lithographic apparatus and device manufacturing method

US7573574 - Aug 11, 2009

Alignment mark and a method of aligning a substrate comprising such an alignment mark

US20090195768 - Aug 06, 2009

Alignment apparatus for manufacturing a liquid jet head, an alignment method for manufacturing the same and method of manufacturing a liquid jet head unit

US20090185184 - Jul 23, 2009

Apparatus and methods for detecting overlay errors using scatterometry

US7564557 - Jul 21, 2009

Method and apparatus for lens contamination control

US7564556 - Jul 21, 2009

Method and apparatus for angular-resolved spectroscopic lithography characterization

US7564555 - Jul 21, 2009

Wafer-based optical pattern recognition targets using regions of gratings

US7564554 - Jul 21, 2009

Alignment system and method

US7564534 - Jul 21, 2009

Techniques for determining overlay and critical dimension using a single metrology tool

US7561282 - Jul 14, 2009

Lithographic apparatus, device manufacturing method and device manufactured thereby

US7561270 - Jul 14, 2009

Apparatus and methods for optically monitoring the fidelity of patterns produced by photolitographic tools

US7557921 - Jul 07, 2009

Test object used for projecting a set of marks to infinity

US20090153862 - Jun 18, 2009

Alignment method, alignment system, and product with alignment mark

US20090153861 - Jun 18, 2009

Pattern defect inspection method and apparatus thereof

US7547884 - Jun 16, 2009

Method of aligning a substrate

US20090147259 - Jun 11, 2009

Spatial phase feature location

US20090147237 - Jun 11, 2009

Alignment routine for optically based tools

US7545497 - Jun 09, 2009

Reticle, exposure apparatus, and methods for measuring the alignment state thereof

US7545480 - Jun 09, 2009

Scanning unit of a position measuring arrangement

US20090141276 - Jun 04, 2009

Ion beam irradiating apparatus and method of adjusting uniformity of a beam

US7541601 - Jun 02, 2009

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