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Measurement of thin films using fourier amplitude
US7612891
-
Nov 03, 2009
Methods and devices for measuring tear film and diagnosing tear disorders
US20090201465
-
Aug 13, 2009
Interferometric measurement of dlc layer on magnetic head
US20090185193
-
Jul 23, 2009
Method of characterizing transparent thin-films using differential optical sectioning interference microscopy
US7545510
-
Jun 09, 2009
Photothermal conversion measurement apparatus, photothermal conversion measurement method, and sample cell
US7522287
-
Apr 21, 2009
Apparatus for measuring thickness of a substrate
US20090051924
-
Feb 26, 2009
Method for determining optimal resist thickness
US7492465
-
Feb 17, 2009
System and method for thickness measurement
US7477408
-
Jan 13, 2009
Dual polarization interferometers for measuring opposite sides of a workpiece
US7471396
-
Dec 30, 2008
Tear film measurement
US20080316499
-
Dec 25, 2008
Optical sensor for extreme environments
US20080297808
-
Dec 04, 2008
Measuring the shape, thickness variation, and material inhomogeneity of a wafer
US20080285053
-
Nov 20, 2008
Reduced coherence symmetric grazing incidence differential interferometer
US20080278732
-
Nov 13, 2008
Methods and devices for measuring tear film and diagnosing tear disorders
US20080273171
-
Nov 06, 2008
System, apparatus, and method for determining temperature/thickness of an object using light interference measurements
US7446881
-
Nov 04, 2008
Gas analyzing apparatus and substrate processing system
US20080236747
-
Oct 02, 2008
Interferometer for determining characteristics of an object surface, including processing and calibration
US7428057
-
Sep 23, 2008
Optically balanced instrument for high accuracy measurement of dimensional change
US7426039
-
Sep 16, 2008
Interferometry systems and methods
US7417743
-
Aug 26, 2008
Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method
US7411684
-
Aug 12, 2008
Process control monitors for interferometric modulators
US7403323
-
Jul 22, 2008
Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures
US7403289
-
Jul 22, 2008
Method and apparatus for measuring thickness of thin article
US7403288
-
Jul 22, 2008
Method for optically testing semiconductor devices
US7400411
-
Jul 15, 2008
Characterization of materials with optically shaped acoustic waveforms
US7387027
-
Jun 17, 2008
Temperature/thickness measuring apparatus, temperature/thickness measuring method, temperature/thickness measuring system, control system and control method
US7379189
-
May 27, 2008
Process control monitors for interferometric modulators
US7369252
-
May 06, 2008
System capable of determining applied and anodized coating thickness of a coated-anodized product
US7365860
-
Apr 29, 2008
Method and system for monitoring component consumption
US7353141
-
Apr 01, 2008
Phase measuring method and apparatus for measuring characterization of optical thin films
US7327467
-
Feb 05, 2008
Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures
US7315382
-
Jan 01, 2008
In-situ critical dimension measurement
US7301645
-
Nov 27, 2007
Method and system for on-line measurement of thickness and birefringence of thin plastic films
US7298492
-
Nov 20, 2007
Thickness measurement of moving webs and seal integrity system using dual interferometer
US20070229846
-
Oct 04, 2007
Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method
US20070229845
-
Oct 04, 2007
Method of and apparatus for measuring layer thicknesses and layer homogeneities in containers
US20070229844
-
Oct 04, 2007
Wavelength determining apparatus, method and program for thin film thickness monitoring light
US20070223008
-
Sep 27, 2007
Apparatus for inspecting a ball-bumped wafer
US20070201032
-
Aug 30, 2007
Coating thickness gauge
US20070195331
-
Aug 23, 2007
Semiconductor fabricating apparatus with function of determining etching processing state
US7259866
-
Aug 21, 2007
Process control monitors for interferometric modulators
US7259865
-
Aug 21, 2007
Method and apparatus for performing highly accurate thin film measurements
US20070182970
-
Aug 09, 2007
Method and system for measuring thin films
US7251043
-
Jul 31, 2007
Device for high-accuracy measurement of dimensional changes
US7239397
-
Jul 03, 2007
Method of and device for thickness measurements of thin films
US20070146725
-
Jun 28, 2007
Method and system for monitoring component consumption
US7233878
-
Jun 19, 2007
Method and apparatus for measuring thickness of a material
US7233401
-
Jun 19, 2007
Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method
US7230720
-
Jun 12, 2007
Multi-cavity fabry-perot interferometric thin-film sensor with built-in temperature compensation
US20070115480
-
May 24, 2007
Self referencing heterodyne reflectometer and method for implementing
US20070109551
-
May 17, 2007
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Thickness (18)
Film (15)
Measurements (15)
Method and apparatus (9)
Processing (9)
Method and system (8)
Monitoring (6)
Interferometer (4)
Wafer (2)
Object (2)
Interference (2)
Semiconductor (2)
Sensor (2)
Substrate (2)
Layer (2)