In a system for overcoming or at least damping oscillations in or through channels (9) which carry fluid in a component, in particular coolant in cooling channels in an optical element (1), in particular a projection objective lens (1a) for semiconductor lithography, oscillations which occur are detected and evaluated by sensors (5), after which the result is passed, in the form of an adaptronic control loop to piezoelectric elements (9), which are integrated in the optical element, and are in the form of thin plates, films or layers which, when activated, produce the oscillations or frequencies which counteract oscillations and natural frequencies produced by the turbulence.

In a system for specific deformation of optical elements in an imaging device, in particular in a projection exposure machine having a projection lens for micro-lithography, for the purpose of eliminating image errors or for active adjustment, piezoelectric elements are applied as actuators in the form of thin plates, films or layers to surfaces to be deformed, or integrated into them. In conjunction with an adaptronic servo loop having sensors, forces and/or moments are exerted on the optical elements for their specific deformation by means of a controlled activation of the piezoelectric elements as actuators.

An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. An optical element (5) is therefore acted upon in a rotationally non-symmetrical manner by the radiation of a light source. To temper the optical element (5), a supply apparatus (11, 19 to 23) for gas is used. The latter having at least one supply line (21) and at least one gas directing device (11). The latter is aligned relative to the optical element (5) and controllable in such a way that the gas is directed by the gas directing device (11) towards the optical element (5). The volumetric flow of the exiting gas therefore has a magnitude and spatial distribution (17), which are adapted to the intensity distribution (6) of the radiation. By virtue of such tempering, rotationally non-symmetrical light-induced image defects in the optical element (5) are avoided or compensated.

In an oscillation damping system, the oscillations which act on an optical element in an imaging device, in particular on deformation-decoupled mounts and manipulators in a projection illumination arrangement, in particular in a projection objective for microlithographic projection exposure objective lithography, are detected by sensors, by actuators waves with same or at least similar frequencies and amplitudes of anti-phases to the disturbing oscillations are generated and introduced in said mount.

An optical system, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. The system comprises a light source (30) as well as at least one optical element, in particular a lens or a mirror. In the region of at least one surface acted upon by the radiation (1) of the light source (30) the optical element is substantially symmetrical in relation to an axis of rotational symmetry (5). The optical element or its housing (6) is rotatably connected to a frame (7) by at least one bearing (8, 9, 10). An actuator (18) sets the optical element (25) or its housing (6) in rotation about the axis of rotational symmetry (5). The actuation cooperates with a control device (23). The latter activates the actuator (18) for rotation of the optical element at least temporarily during the period, when the optical element is exposed to lumination. In such a manner rotationally non-symmetrical image defects are compensated.