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Patent # Description
2017/0278734 PRE-SCREENING METHOD, MANUFACTURING METHOD, DEVICE AND ELECTRONIC APPARATUS OF MICRO-LED
A pre-screening method, manufacturing method, device and electronic apparatus of micro-LED. The method for pre-screening defect micro-LEDs comprises: obtaining...
2017/0278733 MICRO PICK AND BOND ASSEMBLY
Micro pick-and-bond heads, assembly methods, and device assemblies. In, embodiments, micro pick-and-bond heads transfer micro device elements, such as (micro)...
2017/0278732 WAFER PLACEMENT APPARATUS
A wafer placement apparatus 30 includes a ceramic substrate 32 having a wafer placement surface, a heater electrode 34 embedded in the ceramic substrate 32,...
2017/0278731 TEMPERATURE CONTROLLER OF SEMICONDUCTOR WAFER AND TEMPERATURE CONTROL METHOD OF SEMICONDUCTOR WAFER
A manipulated variable calculator having a plurality of control loops and configured to calculate manipulated variables to be respectively given to a plurality...
2017/0278730 PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
A plasma processing apparatus including a sample stage arranged in a processing chamber, a temperature regulator arranged in an interior of the sample stage, a...
2017/0278729 SUBSTRATE PROCESSING APPARATUS
According to one embodiment, a substrate processing apparatus includes: a removing part (D1) configured to remove liquid droplets present in a recess (30); a...
2017/0278728 SUBSTRATE CLEANING APPARATUS
A substrate cleaning apparatus includes a substrate holding unit, a brush, an arm, a discharge portion and a guide member. The substrate holding unit is...
2017/0278727 LIQUID PROCESSING APPARATUS
A liquid residue on a bottom surface of a substrate can be reduced while placing the substrate accurately. A liquid processing apparatus includes an inclined...
2017/0278726 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
A substrate processing apparatus comprises: a first chamber; a liquid film former which forms a liquid film P of a solution containing a sublimable substance...
2017/0278725 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND MEMORY MEDIUM
A substrate processing apparatus includes a substrate holding device, a rotation mechanism, a drying liquid supply nozzle, a movement mechanism, a flow rate...
2017/0278724 TREATMENT CUP CLEANING METHOD, SUBSTRATE TREATMENT METHOD, AND SUBSTRATE TREATMENT APPARATUS
A treatment cup cleaning method is provided, which includes: a rotating step of rotating a substrate rotating unit with a substrate being held by the substrate...
2017/0278723 Molding Wafer Chamber
A bottom chase and a top chase of a molding system form a cavity to house a molding carrier and one or more devices. The molding carrier is placed in a desired...
2017/0278722 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
Provided is a semiconductor device with improved reliability that achieves the reduction in size. A semiconductor wafer is provided that has a first insulating...
2017/0278721 SYSTEM AND METHOD FOR MANUFACTURING A FABRICATED CARRIER
A method and apparatus for fabricating a carrier having a top surface and a bottom surface, the method comprising combining a conductive portion at the top...
2017/0278720 METHOD OF FORMING A PATTERN FOR INTERCONNECTION LINES AND ASSOCIATED CONTINUITY BLOCKS IN AN INTEGRATED CIRCUIT
A method for forming a pattern for interconnection lines and associated continuity dielectric blocks in an integrated circuit includes providing a structure...
2017/0278719 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
A technique of reducing the manufacturing cost of a semiconductor device is provided, There is provided a method of manufacturing a semiconductor device...
2017/0278718 CMP POLISHING AGENT, MANUFACTURING METHOD THEREOF, AND METHOD FOR POLISHING SUBSTRATE
The present invention provides a CMP polishing agent containing polishing particles, a protective agent, and water, wherein the protective agent is a...
2017/0278717 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
In a method for manufacturing a semiconductor device, a first dielectric layer is formed over an underlying structure disposed on a substrate. A planarization...
2017/0278716 SEALING SHEET, SEALING SHEET WITH SEPARATOR, SEMICONDUCTOR DEVICE, AND PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE
In order to provide a sealing sheet capable of preventing same from falling off a suction collet during conveyancing, etc., and whereby semiconductor chips can...
2017/0278715 FABRICATION OF FINS USING VARIABLE SPACERS
A method of fabricating semiconductor fins, including, patterning a film stack to produce one or more sacrificial mandrels having sidewalls, exposing the...
2017/0278714 CONTROL DEVICE, SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING METHOD, AND PROGRAM
Disclosed is a control device that controls an operation of a substrate processing apparatus that forms a laminated film by forming a first film on a substrate...
2017/0278713 DEVICES WITH MULTIPLE THRESHOLD VOLTAGES FORMED ON A SINGLE WAFER USING STRAIN IN THE HIGH-K LAYER
A method for adjusting a threshold voltage includes depositing a strained liner on a gate structure to strain a gate dielectric. A threshold voltage of a...
2017/0278712 Planarization Control in Semiconductor Manufacturing Process
A method of forming a semiconductor device includes forming fins on a substrate, depositing a gate layer having a first material on the fins, and depositing a...
2017/0278711 IMPURITY DIFFUSION AGENT COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
A diffusion agent composition that, even when a semiconductor substrate which is an object into which an impurity diffusion ingredient is to be diffused has,...
2017/0278710 Method of Manufacturing Semiconductor Device
Provided is a method of manufacturing a semiconductor device. The method of manufacturing a semiconductor device includes forming a target etching layer on a...
2017/0278709 CONFORMAL STRIPPABLE CARBON FILM FOR LINE-EDGE-ROUGHNESS REDUCTION FOR ADVANCED PATTERNING
Embodiments of the disclosure relate to deposition of a conformal organic material over a feature formed in a photoresist or a hardmask, to decrease the...
2017/0278708 LASER CRYSTALLIZATION DEVICE AND METHOD
A laser crystallization device includes a laser oscillator, a stage, and a reflection unit. The stage is configured to support a substrate with a target film...
2017/0278707 RADIAL AND THICKNESS CONTROL VIA BIASED MULTI-PORT INJECTION SETTINGS
A gas distribution system is disclosed in order to obtain better film uniformity on a substrate in a cross-flow reactor. The better film uniformity may be...
2017/0278706 MULTILAYER STRUCTURE, METHOD FOR MANUFACTURING SAME, SEMICONDUCTOR DEVICE, AND CRYSTALLINE FILM
A multilayer structure with excellent crystallinity and a semiconductor device of the multilayer structure with good mobility are provided. A multilayer...
2017/0278705 NITRIDE FILM FORMING METHOD AND STORAGE MEDIUM
There is provided a nitride film forming method which includes: performing a pretreatment in which a chlorine-containing gas is supplied while heating a...
2017/0278704 PHOTOCURABLE COMPOSITION, METHOD FOR FORMING A PATTERN, AND METHOD FOR PRODUCING A PHOTOCURED PRODUCT
It is intended to provide a photocured product that is prepared using the photo-imprint method and has favorable pattern precision and improvement in pattern...
2017/0278703 Spin On Hard Mask Material
Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative and a crosslinking agent. Further disclosed is a...
2017/0278702 METHOD FOR TREATING SURFACE OF SEMICONDUCTOR LAYER, SEMICONDUCTOR SUBSTRATE, METHOD FOR MAKING EPITAXIAL SUBSTRATE
A surface treatment method for a semiconductor layer includes growing a first layer on a substrate in a growth reactor, the first layer consisting of one of...
2017/0278700 TECHNIQUE FOR OXIDIZING PLASMA POST-TREATMENT FOR REDUCING PHOTOLITHOGRAPHY POISONING AND ASSOCIATED STRUCTURES
Embodiments of the present disclosure describe techniques for oxidizing plasma post-treatment for reducing photolithography poisoning. In one embodiment, an...
2017/0278699 CONTROL DEVICE, SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING METHOD, AND PROGRAM
Disclosed is a control device that controls an operation of a substrate processing apparatus. The control device includes a recipe memory unit that stores a...
2017/0278698 Semiconductor Device Manufacturing Method and Semiconductor Device Manufacturing System
A semiconductor device manufacturing method includes: a primary process of supplying a process gas to a substrate having a depression formed therein to form a...
2017/0278697 Nitride Film Forming Method and Storage Medium
There is provided a method for forming a nitride film on a substrate to be processed by a thermal ALD which repeats: supplying a film forming raw material gas...
2017/0278696 COATING APPARATUS
A coating apparatus includes an open/close valve having a motor that allows control of opening operation and closing operation in accordance with electric...
2017/0278695 POLYMER REMOVAL USING CHROMOPHORES AND LIGHT EXPOSURE
A method for processing a substrate includes receiving a substrate having fluorinated polymer residue on a surface of the substrate. The fluorinated polymer...
2017/0278694 High Brightness Laser-Sustained Plasma Broadband Source
A high brightness laser-sustained broadband light source includes a gas containment structure and a pump laser configured to generate a pump beam including...
2017/0278693 Mass Filtering of Ions Using a Rotating Field
Systems and methods for filtering a continuous beam of ions are provided. An acceleration electric field is applied to a continuous beam of ions using an...
2017/0278692 MULTI-REFLECTION MASS SPECTROMETER
A multi-reflection mass spectrometer is provided comprising two ion-optical mirrors, each mirror elongated generally along a drift direction (Y), each mirror...
2017/0278691 TIME-OF-FLIGHT MASS SPECTROMETER
A voltage applied to an exit gate electrode forming a potential barrier and temporarily trapping ions within the inner space of the ion guide is higher than a...
2017/0278690 IONIZATION DEVICE WITH MASS SPECTROMETER THEREWITH
An ionization device includes: a plasma generating device for generating metastable particles and/or ions of an ionization gas in a primary plasma region; a...
2017/0278689 MASS ANALYSER AND METHOD OF MASS ANALYSIS
An electrostatic ion trap for mass analysis includes a first array of electrodes and a second array of electrodes, spaced from the first array of electrode....
2017/0278688 Soft Ionization Based on Conditioned Glow Discharge for Quantitative Analysis
One aspect of the disclosure provides a method of mass spectrometric analysis that includes producing either glow discharge within a noble gas between 3-100...
2017/0278687 BATCH PRODUCTION OF MICROCHANNEL PLATE PHOTO-MULTIPLIERS
In-situ methods for the batch fabrication of flat-panel micro-channel plate (MCP) photomultiplier tube (PMT) detectors (MCP-PMTs), without transporting either...
2017/0278686 Ionized Physical Vapor Deposition (IPVD) Apparatus And Method For An Inductively Coupled Plasma Sweeping Source
Embodiments of methods and systems for an inductively coupled plasma sweeping source for an IPVD system. In an embodiment, a method includes providing a large...
2017/0278685 DUAL POWER FEED ROTARY SPUTTERING CATHODE
A rotary sputtering cathode assembly is provided that comprises a rotatable target cylinder having a first end and an opposing second end. A first power...
2017/0278684 NON-AMBIPOLAR PLASMA EHNCANCED DC/VHF PHASOR
This disclosure relates to a plasma processing system for controlling plasma density across a substrate and maintaining a tight ion energy distribution within...
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