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Patent # Description
2017/0316951 FABRICATION OF FINS USING VARIABLE SPACERS
A method of fabricating semiconductor fins, including, patterning a film stack to produce one or more sacrificial mandrels having sidewalls, exposing the...
2017/0316950 METHOD FOR FORMING PATTERNS OF A SEMICONDUCTOR DEVICE
A method for forming patterns of a semiconductor device includes sequentially forming a hard mask layer, a sacrificial layer, and an anti-reflection layer on a...
2017/0316949 METHOD OF ETCHING ATOMIC LAYER
The present disclosure relates to a method of etching an atomic layer, that is capable of simultaneously removing an upper surface and a side surface of an...
2017/0316948 TRANSFORMER, PLASMA PROCESSING APPARATUS, AND PLASMA PROCESSING METHOD
A transformer includes: a rotary shaft configured to rotate about a central axis of the rotary shaft as a rotational axis; a primary-side first coil configured...
2017/0316947 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
A substrate processing method includes a fluorine-based gas supply step of supplying a fluorine-based gas into a processing chamber where a substrate having a...
2017/0316946 METHODS FOR CHEMICAL ETCHING OF SILICON
Improved methods for chemically etching silicon are provided herein. In some embodiments, a method of etching a silicon material includes: (a) exposing the...
2017/0316945 BOTTOM SOURCE/DRAIN SILICIDATION FOR VERTICAL FIELD-EFFECT TRANSISTOR (FET)
A method for manufacturing a semiconductor device includes forming a first active region on a semiconductor substrate, forming a semiconductor layer on the...
2017/0316944 SHORT-CHANNEL NFET DEVICE
A semiconductor device has an active region that includes a semiconductor layer. A transistor is formed in and above the active region, wherein the transistor...
2017/0316943 Hybrid Doping Profile
A semiconductor device having a hybrid doping distribution and a method of fabricating the semiconductor device are presented. The semiconductor device...
2017/0316942 SYSTEMS AND METHODS FOR A TUNABLE ELECTROMAGNETIC FIELD APPARATUS TO IMPROVE DOPING UNIFORMITY
Systems and methods for improving doping and/or deposition uniformity using a tunable electromagnetic field generation device are provided. In an exemplary...
2017/0316941 AN APPARATUS AND METHOD FOR CONTROLLING DOPING
An apparatus and method, the apparatus comprising: at least one charged substrate (3); a channel of two dimensional material (5); and at least one floating...
2017/0316940 METHOD FOR FORMING SPACERS USING SILICON NITRIDE FILM FOR SPACER-DEFINED MULTIPLE PATTERNING
A method of forming spacers for spacer-defined multiple pattering (SDMP), includes: depositing a pattern transfer film by PEALD on the entire patterned surface...
2017/0316939 Method for Patterning a Substrate Using a Layer with Multiple Materials
Techniques herein include forming single or multi-layer mandrels and then forming one or more lines of material running along sidewalls of the mandrels. A...
2017/0316938 Mandrel Spacer Patterning in Multi-Pitch Integrated Circuit Manufacturing
A method of manufacturing an integrated circuit (IC) includes receiving a design layout of the IC, wherein the design layout includes two abutting blocks, the...
2017/0316937 Low-Temperature Formation Of Thin-Film Structures
Methods for low-temperature formation of one or more thin-film semiconductor structures on a substrate that include the steps of, forming a (poly)silane layer...
2017/0316936 OPTICAL FILTERING FOR INTEGRATED DIELECTRICS UV CURING PROCESSES
A method of forming a semiconductor device includes forming a dielectric layer over a substrate, and curing the dielectric layer with a first curing process....
2017/0316935 ETCHING SUBSTRATES USING ALE AND SELECTIVE DEPOSITION
Methods of and apparatuses for processing substrates having carbon-containing material using atomic layer deposition and selective deposition are provided....
2017/0316934 METHOD FOR PROCESSING A SEMICONDUCTOR REGION AND AN ELECTRONIC DEVICE
According to various embodiments, a method for processing a semiconductor region, wherein the semiconductor region comprises at least one precipitate, may...
2017/0316933 SOURCE/DRAIN PERFORMANCE THROUGH CONFORMAL SOLID STATE DOPING
A method for improving source/drain performance through conformal solid state doping and its resulting device are disclosed. Specifically, the doping takes...
2017/0316932 GALLIUM NITRIDE NANOWIRE BASED ELECTRONICS
GaN based nanowires are used to grow high quality, discreet base elements with c-plane top surface for fabrication of various semiconductor devices, such as...
2017/0316931 EPITAXIAL BASE
An epitaxial base is provided. The epitaxial base includes a substrate and a carbon nanotube layer. The substrate has an epitaxial growth surface and defines a...
2017/0316930 METHODS FOR CONFORMAL TREATMENT OF DIELECTRIC FILMS WITH LOW THERMAL BUDGET
Embodiments of methods for treating dielectric layers are provided herein. In some embodiments, a method of treating a dielectric layer disposed on a substrate...
2017/0316929 Semiconductor Device Having a Defined Oxygen Concentration
A method for manufacturing a substrate wafer 100 includes providing a device wafer (110) having a first side (111) and a second side (112); subjecting the...
2017/0316928 METHODS, APPARATUS, AND SYSTEM FOR MASS SPECTROMETRY
A miniature, low cost mass spectrometer capable of unit resolution over a mass range of 10 to 50 AMU. The mass spectrometer incorporates several features that...
2017/0316927 Mass Spectrometer Vacuum Interface Method and Apparatus
A mass spectrometer vacuum interface can include a skimmer apparatus having a skimmer aperture and an internal surface. A method of operating the mass...
2017/0316926 Sampling Interface for Mass Spectrometry Systems and Methods
Methods and systems for delivering a liquid sample to an ion source for the generation of ions and subsequent analysis by mass spectrometry are provided...
2017/0316925 A Two-Dimensional Anode Array Or Two-Dimensional Multi-Channel Anode For Large-Area Photodetection
A two-dimensional anode array or two-dimensional multi-channel anode includes a substrate, a number of conductive regions on the substrate, and a number of...
2017/0316924 NON-DISAPPEARING ANODE FOR USE WITH DIELECTRIC DEPOSITION
Embodiments of the invention generally relate to an anode for a semiconductor processing chamber. More specifically, embodiments described herein relate to a...
2017/0316922 GAS SUPPLY STRUCTURE FOR INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS
A gas supply structure for an inductively coupled plasma (ICP) processing apparatus that includes a main container 10 that houses a substrate to be processed S...
2017/0316921 VHF Z-COIL PLASMA SOURCE
A VHF Z-coil semiconductor processing plasma source uses Inductively Coupled Plasma (ICP) and has a Z-shaped coil wound about a chamber in two interconnected...
2017/0316920 APPARATUS AND METHOD FOR TREATING A SUBSTRATE
An antenna and a substrate treating process utilizing the same are provided. The antenna may extend along an imaginary baseline having predetermined curvature...
2017/0316919 PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
A plasma processing method including: a film formation step of forming a silicon-containing film on a surface of a member inside a chamber by plasma of a...
2017/0316918 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, ION BEAM ETCHING DEVICE, AND CONTROL DEVICE
An ion beam etching device includes a grid provided between a treatment chamber and a plasma generation chamber, and for forming an ion beam by drawing ions...
2017/0316917 PLASMA PROCESSING DEVICE
A plasma processing device includes: a chamber; a flat-plate-shaped first electrode; a first high frequency power supply; a helical second electrode disposed...
2017/0316916 COMPRESSIVE SCANNING SPECTROSCOPY
Mask-modulated spectra are incident to a sensor and are summed during a frame time. After the frame time, a compressed spectrum is read out based on the sum...
2017/0316915 Charged Particle Beam Apparatus
Provided is a charged particle beam apparatus which includes a charged particle source, a sample table on which a sample is placed, a charged particle beam...
2017/0316914 STAGE MECHANISM
According to one aspect of the present invention, a stage mechanism includes a movable stage disposed in a vacuum atmosphere and mounting a heat source, a...
2017/0316913 Sample Stage
Sample stage, e.g. for use in a scanning electron microscope. The sample stage includes a base, a sample carrier, and an actuator assembly arranged for moving...
2017/0316912 PARTICLE BEAM SYSTEM AND METHOD FOR THE PARTICLE-OPTICAL EXAMINATION OF AN OBJECT
A particle beam system includes a particle source to produce a first beam of charged particles. The particle beam system also includes a multiple beam producer...
2017/0316911 X-RAY GENERATING APPARATUS AND RADIOGRAPHY SYSTEM USING THE SAME
Heat dissipation of a target is enhanced in a transmissive X-ray generating apparatus where an anode member constitutes a part of a container. An anode member...
2017/0316910 ION GENERATION APPARATUS AND ELECTRIC EQUIPMENT INCLUDING THE SAME
A housing, a substrate accommodated in the housing, a needle electrode for generating ions through discharging, which is held by the substrate such that a tip...
2017/0316909 GAS INLET FOR AN ION THRUSTER
A gas inlet suitable in particular for use in an ion thruster includes a housing which is made of a gas-tight ceramics material, and an insert which is...
2017/0316908 RECLOSER BATTERY ASSEMBLY
A circuit interrupting device for use with a electrical power distribution system includes a housing containing a circuit interrupting mechanism. A battery...
2017/0316907 ROBUST MICROELECTROMECHANICAL SWITCH
A microelectromechanical system switch includes a signal input line, a signal output line, a deformable conducting membrane electrically connected to the...
2017/0316906 ELECTROMAGNETIC RELAY
An electromagnetic relay including: a base unit that includes a slit having a first wall part and a second wall part, and a first projection projecting from...
2017/0316905 METHODS OF DETERMINING THE ORDER OF OPERATING CONTACTORS IN HIGH VOLTAGE CIRCUITS
A method of controlling positive and negative contactors in a high voltage electrical system includes sensing current flowing through each contactor prior to...
2017/0316904 MEDIUM- OR HIGH-VOLTAGE CIRCUIT BREAKER OR ISOLATOR, PROVIDED WITH IMPROVED FIXED CONTACTS, AND METHOD OF USE
A high- or medium-voltage circuit breaker, in which a movable contact (1) is moved in sliding in order to separate stationary contacts (11, 12) from its...
2017/0316903 OPERATING DEVICE
An operating device includes: an operating section that rotates about a predetermined axis; and a shaft part to move integrally with the operating section. The...
2017/0316902 APPARATUS FOR OPERATING A ROTARY SWITCH
An rotary switch operating apparatus has a drive shaft and a first and a second drive element, the first drive element having a rotationally fixed coupling to...
2017/0316901 INPUT DEVICE
An input device has a first electrode, a second electrode, and a third electrode. The second electrode opposes to the first electrode while being spaced apart...
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