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Patent # Description
2017/0358472 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE TRANFSER METHOD
A substrate processing apparatus according to the present invention comprises a transferring device including a grasping section configured to grasp a...
2017/0358471 WAFER CONTAINER WITH DAMPENING MECHANISM
A wafer container is provided. The wafer container includes a pod base having a top surface and a bottom surface, a cassette disposed on the top surface, and a...
2017/0358470 SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING METHOD, AND STORAGE MEDIUM
A substrate liquid processing apparatus includes a liquid processing unit, a processing liquid circulating line, and a boiling state detecting unit provided in...
2017/0358469 MANUFACTURING APPARATUS AND MANUFACTURING METHOD OF LIGHT-EMITTING ELEMENT
Disclosed is a manufacturing apparatus of a light-emitting element. The manufacturing apparatus includes: a main transporting route including a first transfer...
2017/0358468 PEELING APPARATUS
A peeling apparatus peels a protective member off a wafer, the protective member including a resin and a film which is fixed to one surface of the wafer with...
2017/0358467 METHOD OF FABRICATING A FAN-OUT PANEL LEVEL PACKAGE AND A CARRIER TAPE FILM THEREFOR
The present disclosure relates to a method of fabricating a semiconductor package. The method may include forming a cavity in a package substrate and providing...
2017/0358466 SUBSTRATE TREATMENT METHOD
A substrate treatment method and apparatus including a change controlling unit which changes at least one of a protection liquid application position relative...
2017/0358465 WAFER PROCESSING SYSTEM
A wafer processing system includes a laser processing apparatus, a grinding apparatus, a tape sticking apparatus, a first cassette placement part, a second...
2017/0358464 LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE MEDIUM
Disclosed is a liquid processing apparatus including: a plurality of substrate placement regions; a nozzle that supplies a processing liquid to a substrate...
2017/0358463 ASSEMBLING DEVICE USED FOR SEMICONDUCTOR EQUIPMENT
The present invention is directed to an assembling device used for semiconductor equipment. The assembling device includes a chamber lid, a ceiling, a...
2017/0358462 MANUFACTURING METHOD OF SEMICONDUCTOR PACKAGE
A manufacturing method of a semiconductor package includes disposing one or more semiconductor devices on a base substrate, each of the one or more...
2017/0358461 CONDUCTOR COMPOSITION INK, LAMINATED WIRING MEMBER, SEMICONDUCTOR ELEMENT AND ELECTRONIC DEVICE, AND METHOD FOR...
A conductor of the invention is in a form of a conductive convex portion in a laminated wiring member and includes a conductive material and a liquid...
2017/0358460 ETCHING PROCESS METHOD
An etching process method is provided that includes outputting a first high frequency power of a first frequency from a first high frequency power supply, and...
2017/0358459 METHOD FOR PATTERNING A THIN FILM
A method for producing at least one pattern in a layer resting on a substrate, including: a) making amorphous at least one first block of an upper layer of...
2017/0358458 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, HEAT TREATMENT APPARATUS, AND STORAGE MEDIUM
A method of manufacturing a semiconductor device includes: loading a substrate into a process container after dry-etching a portion of a silicon film formed in...
2017/0358457 METHOD OF FABRICATING SEMICONDUCTOR DEVICE
A method of fabricating a semiconductor device is provided. The method includes forming a first fin structure which includes first semiconductor patterns and...
2017/0358456 LINE EDGE ROUGHNESS IMPROVEMENT WITH PHOTON-ASSISTED PLASMA PROCESS
A photon-assisted plasma processing method for processing a substrate with a process layer is provided. A process gas is flowed into the chamber. The process...
2017/0358455 METHOD OF FORMING FIN-SHAPED STRUCTURE
A fin-shaped structure includes a substrate having a first fin-shaped structure located in a first area and a second fin-shaped structure located in a second...
2017/0358454 METHOD FOR MANUFACTURING FLEXIBLE ELECTRODE USING SPUTTERING PROCESS
There is provided a method for manufacturing a flexible electrode, the method comprising: cleaning a plastic substrate; forming a metal-oxide seed layer on the...
2017/0358453 MATERIAL REMOVAL PROCESS FOR SELF-ALIGNED CONTACTS
A method is disclosed of removing a first material disposed over a second material adjacent to a field effect transistor gate having a gate sidewall layer that...
2017/0358452 Superjunction Structure in a Power Semiconductor Device
A method of processing a power semiconductor device includes: providing a semiconductor body of the power semiconductor device; coupling a mask to the...
2017/0358451 METHOD FOR MANUFACTURlNG AN ELECTRICAL CONTACT ON A STRUCTURE
The invention relates to a method for manufacture of an electrical contact on a structure (10) made of an anisotropic material NA which exhibits an anisotropic...
2017/0358450 Organic Mandrel Protection Process
Provide is a method of patterning spacers, the method comprising: providing an initial patterned structure in a substrate in a processing chamber, the initial...
2017/0358449 LASER CRYSTALLIZATION DEVICE
A laser crystallization method includes exciting gas medium in an airtight container to generate laser beams; amplifying the laser beams by reflecting the...
2017/0358448 SHELL-ENABLED VERTICAL ALIGNMENT AND PRECISION-ASSEMBLY OF A CLOSE-PACKED COLLOIDAL CRYSTAL FILM
A nanowire includes an electrically conductive catalyst nanoparticle first portion, a semiconductor wire second portion, a first dielectric shell around the...
2017/0358447 METHOD FOR PRODUCING GLASS SUBSTRATE WITH THROUGH GLASS VIAS AND GLASS SUBSTRATE
A method for producing a glass substrate with through glass vias according to the present invention includes: irradiating a glass substrate (10) with a laser...
2017/0358446 WAFER PROCESSING APPARATUS AND WAFER PROCESSING METHOD USING THE SAME
A wafer processing apparatus includes at least one pedestal, at least one ultraviolet (UV) light source, and a window. The pedestal is configured to support a...
2017/0358445 METHODS FOR PLASMA DEPOSITING POLYMERS COMPRISING CYCLIC SILOXANES AND RELATED COMPOSITIONS AND ARTICLES
Methods for plasma depositing polymers comprising cyclic siloxanes and related articles and compositions are generally provided. In some embodiments, the...
2017/0358444 Lanthanum Precursors For Deposition Of Lanthanum, Lanthanum Oxide And Lanthanum Nitride Films
Metal coordination complexes comprising a metal atom coordinated to at least one aza-allyl ligand having the structure represented by: ##STR00001## where each...
2017/0358443 METHOD OF MANUFACTURING NITRIDE SEMICONDUCTOR SUBSTRATE
A method of manufacturing a nitride semiconductor substrate includes providing a silicon substrate having a first surface and a second surface opposing each...
2017/0358442 TARGET IMAGE-CAPTURE DEVICE, EXTREME-ULTRAVIOLET-LIGHT GENERATION DEVICE, AND EXTREME-ULTRAVIOLET-LIGHT...
A target image-capture device may be configured to capture an image of a target that is made into plasma when irradiated with laser light and generates...
2017/0358441 FAST START FLUORESCENT LIGHT BULB
An RF fluorescent lamp, comprising a bulbous vitreous portion of the RF fluorescent lamp comprising a vitreous envelope filled with a working gas mixture, a...
2017/0358440 TIME-OF-FLIGHT MASS SPECTROMETER
An ion reflector has a configuration in which multiple plate electrodes having a rectangular opening are arranged. The components are arranged so that a...
2017/0358439 MINIATURE TIME-OF-FLIGHT MASS SPECTROMETER
A miniature time-of-flight mass spectrometer (TOF-MS) was developed for a NASA/ASTID program beginning 2008. The primary targeted application for this...
2017/0358438 SYSTEMS AND METHODS FOR AUTOMATED ANALYSIS OF OUTPUT IN SINGLE PARTICLE INDUCTIVELY COUPLED PLASMA MASS...
The present disclosure provides methods and systems for automated analysis of spectrometry data corresponding to particles of a sample, such as large data sets...
2017/0358437 FOURIER TRANSFORM ION CYCLOTRON RESONANCE MASS SPECTROMETRY
Methods and systems for analyzing ions in a magnetic ion trap are provided herein. In accordance with various aspects of the present teachings, the methods and...
2017/0358436 SAMPLE SUPPORTING BODY AND METHOD OF MANUFACTURING SAMPLE SUPPORTING BODY
A sample support according to an aspect is a sample support for a surface-assisted laser desorption/ionization method, and includes: a substrate in which a...
2017/0358435 Fast-Switching High Voltage Waveform Generator
A high-voltage waveform generator comprising a power source, a transformer unit comprising a magnetic core, attached to the power source, a plurality of power...
2017/0358434 BIG-DATA ANALYZING METHOD AND MASS SPECTROMETRIC SYSTEM USING THE SAME METHOD
Provided is a method for sorting a number of samples into an appropriate number of clusters according to their characteristics. Highly-correlated peaks are...
2017/0358433 Mass Spectrometer with Bypass of a Fragmentation Device
A method for analyzing a mixture of components includes forming precursor ions from the components, alternately causing the precursor ions to pass to and to...
2017/0358432 HYBRID SOLAR GENERATOR
A solar generator can include a photon-enhanced thermionic emission generator with a cathode to receive solar radiation. The photon-enhanced thermionic...
2017/0358431 SYSTEMS AND METHODS FOR CONTROLLING A VOLTAGE WAVEFORM AT A SUBSTRATE DURING PLASMA PROCESSING
Systems and methods for controlling a voltage waveform at a substrate during plasma processing include applying a shaped pulse bias waveform to a substrate...
2017/0358430 ALUMINUM APPARATUS WITH ALUMINUM OXIDE LAYER AND METHOD FOR FORMING THE SAME
In a method, an aluminum body is chemically treated with at least one of an alkaline solution and an acid solution. Anode-oxidization is performed on the...
2017/0358429 Redundant Power Supply System for a Plasma Process
A power supply system for a plasma process includes two separate power supplies of essentially identical performance characteristics, including a first power...
2017/0358428 RF POWER DELIVERY REGULATION FOR PROCESSING SUBSTRATES
Methods of operating a plasma enhanced substrate processing system using pulsed radio frequency (RF) power are provided herein. In some embodiments, a method...
2017/0358427 PLASMA ANTENNA AND APPARATUS FOR GENERATING PLASMA HAVING THE SAME
Provided are a plasma antenna and a plasma generating apparatus including the same. The plasma antenna includes a first antenna inducing electromagnetic fields...
2017/0358426 EXPOSURE APPARATUS AND EXPOSURE METHOD
To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus...
2017/0358425 MULTI CHARGED-PARTICLE BEAM WRITING APPARATUS AND ADJUSTMENT METHOD FOR THE SAME
In one embodiment, a multi charged-particle beam writing apparatus includes a plurality of blankers switching between ON and OFF state of a corresponding beam...
2017/0358424 ELECTRONIC BEAM MACHINING SYSTEM
The disclosure relates to an electronic beam machining system. The system includes a vacuum chamber; an electron gun located in the vacuum chamber and used to...
2017/0358423 APPARATUS FOR MODIFYING SURFACES OF TITANIUM IMPLANTS MADE OF TITANIUM ALLOY
A metal surface modification apparatus having a tilting unit includes holding jigs having respective lower parts having curved surfaces to hold the implants; a...
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