Easy To Use Patents Search & Patent Lawyer Directory

At Patents you can conduct a Patent Search, File a Patent Application, find a Patent Attorney, or search available technology through our Patent Exchange. Patents are available using simple keyword or date criteria. If you are looking to hire a patent attorney, you've come to the right place. Protect your idea and hire a patent lawyer.

Searching:





Search by keyword, patent number, inventor, assignee, city or state:




Patent # Description
2018/0019138 POWER ELECTRONIC SWITCHING DEVICE AND POWER SEMICONDUCTOR MODULE THEREWITH
A switching device and a power semiconductor module are configured with a substrate, a power semiconductor component arranged thereupon and with a load...
2018/0019137 ACTIVATION METHOD FOR SILICON SUBSTRATES
The present invention relates to an activation composition for activation of silicon substrates, which is an aqueous solution comprising a source of palladium...
2018/0019136 Individually-Tunable Heat Reflectors in an EPI-Growth System
A semiconductor fabrication system includes a wafer carrier configured to carry a wafer thereon. A radiation source is positioned above the wafer carrier. The...
2018/0019135 ALUMINUM COMPOUND AND METHODS OF FORMING THIN FILM AND FABRICATING INTEGRATED CIRCUIT DEVICE BY USING THE SAME
Provided are an aluminum compound represented by General Formula (I), a method of forming a thin film, and a method of fabricating an integrated circuit...
2018/0019134 NON-VOLATILE MEMORY DEVICE AND METHOD OF FABRICATING THE SAME
Provided are a non-volatile memory device and a method of fabricating the same. The non-volatile memory includes a channel layer, a data storage layer disposed...
2018/0019133 Self-Aligned Insulated Film For High-K Metal Gate Device
An integrated circuit includes a semiconductor substrate, a gate dielectric over the substrate, and a metal gate structure over the semiconductor substrate and...
2018/0019132 Method for Producing a Superjunction Device
Disclosed is a method that includes forming a plurality of semiconductor arrangements one above the other. In this method, forming each of the plurality of...
2018/0019131 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
A p-type base layer (2) is formed on a surface of an n-type silicon substrate (1). First and second n.sup.+-type buffer layers (8,9) 9 are formed on a back...
2018/0019130 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
Provided is a method including the following steps: forming an insulating film having a thickness of 0.5 .mu.m or greater on an epitaxial layer provided with a...
2018/0019129 SEMICONDUCTOR DEVICE MANUFACTURING METHOD
There is a problem that even if impurities are made to thermally diffuse in a temperature range of 700.degree. C.-1150.degree. C., a good ohmic contact cannot...
2018/0019128 METHOD OF MANUFACTURING SEMICONDUCTOR STRUCTURE
A semiconductor structure includes a substrate, at least one active semiconductor fin, at least one insulating structure, a gate electrode, and a gate...
2018/0019127 METHOD FOR PROCESSING A WAFER, AND LAYER STACK
In various embodiments, a method for processing a wafer is provided. The method includes forming a layer stack, including a support layer and a useful layer...
2018/0019126 APPARATUS FOR PROCESSING A SUBSTRATE AND DISPLAY DEVICE BY USING THE SAME
Disclosed herein is an apparatus for processing a substrate that forms a hole in a substrate while reducing a burr in the hole so that a module device can be...
2018/0019125 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
A method of manufacturing a semiconductor device, the method including supplying a first reactant to inside a processing chamber into which a substrate has...
2018/0019124 METAL-METAL DIRECT BONDING METHOD
A method for assembling a first substrate and a second substrate by metal-metal direct bonding, includes providing a first layer of a metal at the surface of...
2018/0019123 Laser irradiation induced surface planarization of polycrystalline silicon films
A method for planarizing excimer laser annealed (ELA) poly-crystalline thing films via irradiation. The method includes providing an ELA thin film having an...
2018/0019122 DESIGN AND SYNTHESIS OF METAL OXIDE SURFACES AND INTERFACES WITH CRYSTALLOGRAPHIC CONTROL USING...
The present invention provides integrated nanostructures comprising a single-crystalline matrix of a material A containing aligned, single-crystalline...
2018/0019121 METHOD AND MATERIAL FOR CMOS CONTACT AND BARRIER LAYER
The present disclosure generally relate to methods for forming an epitaxial layer on a semiconductor device, including a method of forming a tensile-stressed...
2018/0019120 PRODUCTION OF A SEMICONDUCTOR SUPPORT BASED ON GROUP III NITRIDES
The invention relates to a method for producing a support for the production of a semiconductor structure based on group III nitrides, characterised in that...
2018/0019119 DRYING HIGH ASPECT RATIO FEATURES
Methods of drying a semiconductor substrate may include applying a drying agent to a semiconductor substrate, where the drying agent wets the semiconductor...
2018/0019118 PATTERN FORMING METHOD AND HEATING APPARATUS
The present invention, when forming a pattern on a substrate, forms a film of a block copolymer containing at least two polymers on the substrate, heats the...
2018/0019117 HIGH GROWTH RATE DEPOSITION FOR GROUP III/V MATERIALS
Aspects of the disclosure relate to processes for epitaxial growth of Group III/V materials at high rates, such as about 30 .mu.m/hr or greater, for example,...
2018/0019116 SELF-LIMITING AND SATURATING CHEMICAL VAPOR DEPOSITION OF A SILICON BILAYER AND ALD
Embodiments described herein provide a self-limiting and saturating Si--O.sub.x bilayer process which does not require the use of a plasma or catalyst and that...
2018/0019115 SEMICONDUCTOR SUBSTRATE AND MANUFACTURING METHOD THEREOF
A semiconductor substrate and a manufacturing method thereof are provided. The semiconductor substrate has an epitaxy region located at a central portion of a...
2018/0019114 METHOD FOR DEPOSITING A SILICON NITRIDE FILM
A method for depositing a silicon nitride film is provided. A nitrided adsorption site is formed in a recess formed in a surface of a substrate by supplying an...
2018/0019112 LIQUID PROCESSING METHOD, MEMORY MEDIUM AND LIQUID PROCESSING APPARATUS
A liquid processing apparatus for liquid-processing a substrate includes a substrate holding device that rotates a substrate in horizontal position, a nozzle...
2018/0019111 ION TRANSFER TUBE FLOW AND PUMPING SYSTEM LOAD
A mass spectrometer system can include an ion source, a vacuum chamber; a mass analyzer within the vacuum chamber, a transfer tube between the ion source and...
2018/0019110 Mass Spectrometry Data Analysis Method
A mass spectrometry data analysis method for analyzing a specimen having a composition where two different reference chemical structures A and B that are each...
2018/0019109 MN-ZN-O SPUTTERING TARGET AND PRODUCTION METHOD THEREFOR
Provided is a Mn--Zn--O sputtering target which can be used in DC sputtering, and a production method for the target. The Mn--Zn--O sputtering target comprises...
2018/0019108 SPUTTERING TARGET WITH BACKSIDE COOLING GROOVES
Implementations of the present disclosure relate to a sputtering target for a sputtering chamber used to process a substrate. In one implementation, a...
2018/0019107 FOCUS RING REPLACEMENT METHOD AND PLASMA PROCESSING SYSTEM
A method performed by a processor of a plasma processing system including a transfer device and a plasma processing apparatus that includes a process chamber....
2018/0019106 Non-Thermal Soft Plasma Cleaning
The present invention provides a Soft Plasma Cleaning (SPC) system (30, 130, 230) including a Guided Soft-Plasma Cleaning (G-SPC) (30). The SPC system is a...
2018/0019105 PLASMA EQUIPMENT FOR TREATING POWDER
A powder plasma processing apparatus is disclosed. The powder plasma processing apparatus is a powder plasma processing apparatus of a circular surface...
2018/0019104 SUBSTRATE PROCESSING CHAMBER COMPONENT ASSEMBLY WITH PLASMA RESISTANT SEAL
Embodiments disclosed herein relate to a substrate processing chamber component assembly with plasma resistant seal. In one embodiment, the semiconductor...
2018/0019103 MICROWAVE CONTROL METHOD
A microwave control method is used in a microwave plasma processing apparatus including a microwave generation unit, a waveguide for guiding a microwave...
2018/0019102 METHOD FOR RF POWER DISTRIBUTION IN A MULTI-ZONE ELECTRODE ARRAY
Embodiments of systems and methods for RF power distribution in a multi-zone electrode array are described. A system may include a plasma source configured to...
2018/0019101 METAL COMPONENT AND MANUFACTURING METHOD THEREOF AND PROCESS CHAMBER HAVING THE METAL COMPONENT
This invention relates to a metal component, a manufacturing method thereof, and a process chamber having the metal component, and particularly to a metal...
2018/0019100 SYSTEM, METHOD, AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTION IN PLASMA PROCESSING SYSTEMS
Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary...
2018/0019099 PLASMA PROCESSING APPARATUS
A plasma processing apparatus includes: a vessel which includes a reaction chamber, atmosphere within the reaction chamber capable of being depressurized; a...
2018/0019098 METHOD OF IMAGING A SPECIMEN USING PTYCHOGRAPHY
A method of imaging a specimen using ptychography includes directing a charged-particle beam from a source through an illuminator so as to traverse the...
2018/0019097 SAMPLE OBSERVATION METHOD AND SAMPLE OBSERVATION DEVICE
An inspection method uses a charged particle microscope to observe a sample and view a defect site or a circuit pattern. A plurality of images is detected by a...
2018/0019096 Charged Particle Beam Device, and Method of Manufacturing Component for Charged Particle Beam Device
The purpose of the present invention is to provide a charged particle beam device that exhibits high performance due to the use of vanadium glass coatings, and...
2018/0019095 CHARGED PARTICLE INSTRUMENTS
An apparatus is disclosed for use in a charged particle instrument which defines an inner volume therein. The apparatus comprises an adaptor (22) having a...
2018/0019094 ELECTRON BEAM DRAWING APPARATUS AND ELECTRON BEAM DRAWING METHOD
In one embodiment, an electron beam drawing apparatus includes an electron gun including a cathode and an anode, a current control circuit controlling a total...
2018/0019093 X-RAY SOURCE, HIGH-VOLTAGE GENERATOR, ELECTRON BEAM GUN, ROTARY TARGET ASSEMBLY, ROTARY TARGET, AND ROTARY...
Disclosed herein are a high-voltage generator for an x-ray source, an x-ray gun, an electron beam apparatus, a rotary vacuum seal, a target assembly for an...
2018/0019092 X-RAY SOURCE, HIGH-VOLTAGE GENERATOR, ELECTRON BEAM GUN, ROTARY TARGET ASSEMBLY, ROTARY TARGET, AND ROTARY...
Disclosed herein are a high-voltage generator for an x-ray source, an x-ray gun, an electron beam apparatus, a rotary vacuum seal, a target assembly for an...
2018/0019091 Emitter, Electron Gun Using Emitter, Electronic Apparatus Using Electron Gun, and Method of Producing Emitter
The emitter of the present invention includes a nanowire. The nanowire is formed from a hafnium carbide (HfC) single crystal, and at least an end portion of...
2018/0019090 MANUFACTURING METHOD OF HIGH-PRESSURE DISCHARGE LAMP AND SEALED PART STRUCTURE FOR HIGH-PRESSURE DISCHARGE LAMP
A method of manufacturing a high-pressure discharge lamp, comprising the steps of: inserting a mount into an interior of a glass tube having an outer diameter...
2018/0019089 IMPROVED MATERIALS AND STRUCTURES FOR LARGE AREA X-RAY DECTECTOR WINDOWS
Embodiments for detectors windows up to 100 mm are disclosed.
2018/0019088 APPARATUS FOR GENERATING X-RAY RADIATION IN AN EXTERNAL MAGNETIC FIELD
An apparatus is provided for generating X-ray radiation in an outer magnetic field, which may be generated by a magnetic field device. The apparatus includes a...
← Previous | 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 58 59 60 61 62 63 64 65 66 67 68 69 70 71 72 73 74 75 76 77 78 79 80 81 82 83 84 85 86 87 88 89 90 91 92 93 94 95 96 97 98 99 100 101 102 103 104 105 106 107 108 109 110 111 112 113 114 115 116 117 118 119 120 121 122 | Next →

File A Patent Application

  • Protect your idea -- Don't let someone else file first. Learn more.

  • 3 Easy Steps -- Complete Form, application Review, and File. See our process.

  • Attorney Review -- Have your application reviewed by a Patent Attorney. See what's included.