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Patent # Description
2018/0040494 Inspection System
The invention relates to an inspection system adapted for determining a state and/or content of a wafer or reticle container or at least a part of a wafer or...
2018/0040493 TRANSFER CHAMBER
To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a...
2018/0040492 Front Opening Ring Pod
A pod for exchanging consumable parts with a process module includes a base plate having a front side, a back side, and first and second lateral sides. A first...
2018/0040491 PLASMA PROCESSING APPARATUS AND METHOD FOR RELEASING SAMPLE
The invention provides a plasma processing apparatus which includes a processing chamber, a radio frequency power source to supply a radio frequency power for...
2018/0040490 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS
A manufacturing method of a semiconductor device according to the present invention comprises cleaning a semiconductor substrate. A first chemical liquid for...
2018/0040489 DEVICE AND METHOD FOR AT LEAST PARTLY DISSOLVING A CONNECTING LAYER OF A TEMPORARILY BONDED SUBSTRATE STACK
A device and method for at least partial loosening of a connecting layer of a temporarily bonded substrate stack. The device has at least one ring, whereby the...
2018/0040488 SUBSTRATE PROCESSING APPARATUS, RECORDING MEDIUM, AND FLUID CIRCULATION MECHANISM
A substrate processing apparatus, includes a reaction furnace, a preparatory chamber provided below the reaction furnace, an elevating mechanism configured to...
2018/0040487 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
In the manufacturing method of a semiconductor device according to an embodiment, a suspension lead is connected to a chip mounting section on which a...
2018/0040486 Methods Of Etching Films Comprising Transition Metals
Provided are methods for etching films comprising transition metals. Certain methods involve activating a substrate surface comprising at least one transition...
2018/0040485 METHOD FOR STRUCTURING A NITRIDE LAYER, STRUCTURED DIELECTRIC LAYER, OPTOELECTRONIC COMPONENT, ETCHING METHOD...
The invention relates to a method for structuring a nitride layer (2), comprising the following steps: A) providing a nitride layer (2) formed with silicon...
2018/0040484 SEMICONDUCTOR SYSTEM
A semiconductor system shares information on a semiconductor manufacturing apparatus between first and second semiconductor manufacturing apparatuses through...
2018/0040483 Methods of Fabricating Semiconductor Devices Including Support Patterns
A method of fabricating semiconductor devices includes sequentially forming a gate layer and a mandrel layer on a substrate, forming a first photoresist on the...
2018/0040482 Method Of Forming Low Height Split Gate Memory Cells
A method of forming a memory device that includes forming a first insulation layer on a semiconductor substrate, forming a conductive material layer on the...
2018/0040481 DYNAMIC RANDOM ACCESS MEMORY WITH LOW LEAKAGE CURRENT AND RELATED MANUFACTURING METHOD THEREOF
A manufacturing method of dynamic random access memory (DRAM) with low leakage current includes forming a plurality of gates within a substrate of the DRAM;...
2018/0040480 SILICON CARBIDE SEMICONDUCTOR SUBSTRATE AND METHOD OF MANUFACTURING SILICON CARBIDE SEMICONDUCTOR SUBSTRATE
A silicon carbide semiconductor substrate includes an epitaxial layer. A difference of a donor concentration and an acceptor concentration of the epitaxial...
2018/0040479 PARTIAL NET SHAPE AND PARTIAL NEAR NET SHAPE SILICON CARBIDE CHEMICAL VAPOR DEPOSITION
A method for fabricating a structure having surfaces exposed to plasma in a substrate processing system includes providing a sacrificial substrate having a...
2018/0040478 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
In an LCD driver, in a high voltage resistant MISFET, end portions of a gate electrode run onto electric field relaxing insulation regions. Wires to become...
2018/0040477 OXIDIZING FILLER MATERIAL LINES TO INCREASE WIDTH OF HARD MASK LINES
A starting semiconductor structure includes a layer of filler material, a hard mask layer over the layer of filler material, and filler material lines over the...
2018/0040476 LOW-TEMPERATURE ATOMIC LAYER DEPOSITION OF BORON NITRIDE AND BN STRUCTURES
Methods of the disclosure include a BN ALD process at low temperatures using a reactive nitrogen precursor, such as thermal N.sub.2H.sub.4, and a boron...
2018/0040475 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
There is provided a method of manufacturing a semiconductor device. The method includes: forming a first amorphous silicon film on a substrate in a process...
2018/0040474 METAL-COMPOUND-REMOVING SOLVENT AND METHOD IN LITHOGRAPHY
A wafer is rinsed with a solvent. The wafer has an increased hydrophobicity as a result of being rinsed with the solvent. A metal-containing material is formed...
2018/0040473 PHOTO-ASSISTED DEPOSITION OF FLOWABLE FILMS
A method and apparatus for forming a flowable film are described. The method includes providing an oxygen free precursor gas mixture to a processing chamber...
2018/0040472 Plasma-Assisted Atomic Layer Epitaxy of Cubic and Hexagonal InN Films and its alloys with AlN at Low Temperatures
Described herein is a method for growing indium nitride (InN) materials by growing hexagonal and/or cubic InN using a pulsed growth method at a temperature...
2018/0040471 LIQUID PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND RECORDING MEDIUM
A liquid processing method can remove pure water existing within a pattern of a substrate and replace the pure water with a solvent rapidly. The liquid...
2018/0040470 Methods For Depositing Low K And Low Wet Etch Rate Dielectric Thin Films
Methods for the formation of SiCN, SiCO and SiCON films comprising cyclical exposure of a substrate surface to a silicon-containing gas, a carbon-containing...
2018/0040469 SEMICONDUCTOR WAFER AND METHOD OF WAFER THINNING USING GRINDING PHASE AND SEPARATION PHASE
A semiconductor wafer has a base material. The semiconductor wafer may have an edge support ring. A grinding phase of a surface of the semiconductor wafer...
2018/0040468 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM WITH PROGRAM STORED THEREIN FOR...
The present disclosure relates to a processing liquid supplying unit configured to supply a processing liquid that contains a removing agent of an adhered...
2018/0040467 Method and Apparatus for Surgical Monitoring Using MALDI-TOF Mass Spectrometry
An apparatus for monitoring a surgical procedure includes a MALDI-TOF mass spectrometer comprising a load lock, an ionization chamber, and an ion detector. A...
2018/0040466 MODULAR ION GENERATOR DEVICE
The present invention provides methods and systems for a modular ion generator device that includes a bottom portion, two opposed side portions, a front end, a...
2018/0040465 AN ION MIRROR, AN ION MIRROR ASSEMBLY AND AN ION TRAP
An ion mirror (10) for use in a time of flight mass spectrometer (100) comprises a first conductor (20) for producing a quadratic field along a first axis...
2018/0040464 SYSTEMS AND METHODS FOR RELAY IONIZATION
The invention generally relates to systems and methods for relay ionization of a sample. In certain aspects, the invention provides systems that include an ion...
2018/0040463 MS/MS Data Processing
A method of identifying precursor ion species from their fragments comprises obtaining mass spectra of a plurality of precursor ion species and their fragments...
2018/0040462 REFRACTORY METAL PLATES WITH IMPROVED UNIFORMITY OF TEXTURE
A refractory metal plate is provided. The plate has a center, a thickness, an edge, a top surface and a bottom surface, and has a crystallographic texture (as...
2018/0040461 APPLICATION OF DIODE BOX TO REDUCE CRAZING IN GLASS COATINGS
Systems, methods, and apparatus are disclosed for reducing crazing in thin film stacks deposited on large area substrates such as glass, for instance...
2018/0040460 Methods and Systems for Monitoring Plasma Processing Systems and Advanced Process and Tool Control
Method and systems for operating a plasma processing chamber are provided. One example method includes processing a substrate in the plasma processing chamber...
2018/0040459 PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
Disclosed herein is a plasma processing apparatus including: a processing chamber in which a sample is to be processed using plasma; a radio-frequency power...
2018/0040458 SYSTEMS AND METHODS OF TREATING A SUBSTRATE
Substrate treating systems are disclosed. The system may include a chamber with a processing space, a supporting unit provided in the processing space to...
2018/0040457 SURFACE TREATMENT FOR IMPROVEMENT OF PARTICLE PERFORMANCE
Implementations of the disclosure provide a surface treatment process for chamber components. In one implementation, the chamber component includes a...
2018/0040456 METHOD FOR MEASURING RESOLUTION OF CHARGED PARTICLE BEAM AND CHARGED PARTICLE BEAM DRAWING APPARATUS
In one embodiment, a method for measuring a resolution of a charged particle beam includes changing a focus position of the charged particle beam in a height...
2018/0040455 APERTURE FOR INSPECTING MULTI BEAM, BEAM INSPECTION APPARATUS FOR MULTI BEAM, AND MULTI CHARGED PARTICLE BEAM...
In one embodiment, an aperture for inspecting a multi-beam allows passage of one beam among multi-beams applied in a multi-beam writing apparatus. The aperture...
2018/0040454 PARTICLE BEAM SYSTEM AND METHOD FOR OPERATING A PARTICLE OPTICAL UNIT
A method for operating a multi-beam particle optical unit comprises includes providing a first setting of effects of particle-optical components, wherein a...
2018/0040453 MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD OF ADJUSTING THE SAME
In one embodiment, a multi charged particle beam writing apparatus includes an emitter that emits a charged particle beam, an aperture plate in which a...
2018/0040452 INSPECTION DEVICE
An electron beam inspection device includes: a primary electron optical system that irradiates the surface of a sample with an electron beam; and a secondary...
2018/0040451 ARRAY SUBSTRATE, DISPLAY PANEL AND DISPLAY APPARATUS HAVING THE SAME, AND FABRICATING METHOD THEREOF
The present application discloses an array substrate comprising a first substrate, a first electrode on the first substrate, a passivation layer on a side of...
2018/0040450 METHOD AND DEVICE FOR THE PRODUCTION OF HIGHLY CHARGED IONS
The invention relates to a novel ion source, which uses method for the production of highly charged ions in the local ion traps created by an axially symmetric...
2018/0040449 MICROSTRUCTURED SURFACE WITH LOW WORK FUNCTION
A horizontal multilayer junction-edge field emitter includes a plurality of vertically-stacked multilayer structures separated by isolation layers. Each...
2018/0040448 FUSE POSITIONING FIXTURE
A fuse positioning fixture includes a fuse positioning template and a fuse loading block. The fuse positioning template includes a number of fuse positioning...
2018/0040447 A CONTROL SYSTEM FOR A BREAKER POLE WITH FORCING, AND BREAKER GEAR
An accumulator control system for one or more electrical breaker poles comprises: an accumulator mechanism presenting a control handle movable at least between...
2018/0040446 MOBILE PART OF AN ELECTROMAGNETIC ACTUATOR FOR AN ELECTRIC CONTACTOR, ACTUATOR COMPRISING SUCH A PART AND CONTACTOR
A mobile part of an electromagnetic actuator for an electric contactor. The mobile part is made up of a flat piece cut from a rolled sheet. This flat piece...
2018/0040445 RELAY DRIVE CIRCUIT
The present invention is intended to provide constant drive conditions of a relay switch. A relay drive circuit includes a current mirror circuit, a current...
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