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Patent # Description
2018/0226251 METHOD FOR FORMING PATTERNS OF SEMICONDUCTOR DEVICE
A method for forming patterns of semiconductor device is provided in the present invention, with steps of filling up first self-assembly material in first...
2018/0226250 METHOD OF FABRICATING A MASK
A method of fabricating a mask includes providing a substrate. A first material layer is disposed on the substrate. Then, the first material layer is partly...
2018/0226249 Process for Producing of Polycrystalline Silicon
The present invention relates to a process for producing of polycrystalline silicon, and the method includes (1) preparing a silicon-containing gas; (2)...
2018/0226248 Synthesis and Fabrication of Transition Metal Dichalcogenide Structures
Methods of synthesis and fabrication of a transition metal dichalcogenide (TMD) structures are disclosed. A method can include first patterning a transition...
2018/0226247 Laser Assisted SiC Growth On Silicon
A heterojunction device is provided. The heterojunction device includes a silicon (Si) substrate; and a film of silicon carbide (SiC) deposited on a surface of...
2018/0226246 METHOD OF MANUFACTURING SILICON CARBIDE EPITAXIAL WAFER
The present invention is aimed at providing a method of manufacturing a silicon carbide epitaxial wafer by which a plurality of silicon carbide epitaxial...
2018/0226245 PLASMA PROCESSING APPARATUS
Disclosed is a plasma processing apparatus including: a first electrode to which a high frequency power is supplied; a second electrode that functions as a...
2018/0226244 SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE
A brush is moved from a central position to an outer periphery position while the brush is contacted with an upper surface of a substrate being rotated at a...
2018/0226243 POLYSILICON CHIP RECLAMATION ASSEMBLY AND METHOD OF RECLAIMING POLYSILICON CHIPS FROM A POLYSILICON CLEANING...
A polysilicon chip reclamation assembly includes a polysilicon cleaning apparatus configured to clean a plurality of bodies of polysilicon. Also included is a...
2018/0226242 PROCESS FOR GROWING NANOWIRES OR NANOPYRAMIDS ON GRAPHITIC SUBSTRATES
A process for growing nanowires or nanopyramids comprising: (I) providing a graphitic substrate and depositing AlGaN, InGaN, AlN or AlGa(In)N on said graphitic...
2018/0226241 Method and Apparatus for Forming Device Quality Gallium Nitride Layers on Silicon Substrates
Atomic Layer Deposition (ALD) is used for heteroepitaxial film growth at reaction temperatures ranging from 80-400.degree. C. The substrate and film materials...
2018/0226240 APPARATUS AND METHOD FOR THERMAL ASSISTED DESORPTION IONIZATION SYSTEMS
The present invention is directed to a method and device to desorb an analyte using heat to allow desorption of the analyte molecules, where the desorbed...
2018/0226239 PROBE ADAPTOR ASSEMBLY
An apparatus for connecting an ionisation probe assembly to a mass and/or ion mobility spectrometer is disclosed. The apparatus comprises: an attachment member...
2018/0226238 Method and Apparatus for Isotope Ratio Mass Spectrometry
A method of isotope ratio mass spectrometry comprising: flowing a liquid mobile phase through a separation device; reducing the flow rate of the mobile phase...
2018/0226237 High Throughput Vacuum Deposition Sources and System
A high throughput deposition apparatus includes a first process chamber; one or more first deposition sources in the first process chamber; a first main...
2018/0226236 MONOCRYSTALLINE SILICON SPUTTERING TARGET
A sputtering target formed from monocrystalline silicon is provided, wherein a sputter surface of the sputtering target is a plane inclined at an angle that...
2018/0226235 Methods for Removing Particles from Etching Chamber
A method includes forming a coating layer in a dry etching chamber, placing a wafer into the dry etching chamber, etching a metal-containing layer of the...
2018/0226234 PLASMA ABATEMENT TECHNOLOGY UTILIZING WATER VAPOR AND OXYGEN REAGENT
Implementations of the present disclosure relate to systems and techniques for abating F-gases present in the effluent of semiconductor manufacturing...
2018/0226233 Powered Grid for Plasma Chamber
A plasma processing chamber and methods for operating the chamber are provided. An exemplary chamber includes an electrostatic chuck for receiving a substrate...
2018/0226232 Semiconductor processing apparatus with protective coating including amorphous phase
Embodiments of the invention relate to compositions including a yttrium-based fluoride crystal phase, or a yttrium-based oxyfluoride crystal phase, or an...
2018/0226231 PLASMA TREATMENT OF AN ELASTOMERIC MATERIAL FOR ADHESION
Elastomeric components, such as a shoe outsole, are treated with a plasma application to clean and activate the elastomeric component. The application of...
2018/0226230 SYSTEMS AND METHODS FOR RADIAL AND AZIMUTHAL CONTROL OF PLASMA UNIFORMITY
A system includes a process chamber, a housing that defines a waveguide cavity, and a first conductive plate within the housing. The first conductive plate...
2018/0226229 Microwave Chemical Processing Reactor
A processing reactor includes a microwave energy source and a field-enhancing waveguide. The field-enhancing waveguide has a field-enhancing zone between a...
2018/0226228 SUBSTRATE PROCESSING APPARATUS
There is provided a substrate processing apparatus which includes: a processing container in which a substrate is accommodated; a substrate supporting part...
2018/0226227 Atomic Layer Etching with Pulsed Plasmas
A system and method for rapid atomic layer etching (ALET) including a pulsed plasma source, with a spiral coil electrode, a cooled Faraday shield, a counter...
2018/0226226 POWER SUPPLY SYSTEM
A power supply system 90 includes high frequency power supplies 92 and 93 that supply a high frequency power for plasma generation; a DC power supply 91 that...
2018/0226224 METHOD OF CONTROLLING AN ADJUSTABLE NOZZLE AND METHOD OF MAKING A SEMICONDUCTOR DEVICE
A method of controlling a position of an adjustable nozzle includes depositing a film on a surface of a wafer. The method includes measuring a thickness...
2018/0226223 CHAMBER WITH FLOW-THROUGH SOURCE
Described processing chambers may include a chamber housing at least partially defining an interior region of a semiconductor processing chamber. The chamber...
2018/0226222 PART TEMPERATURE MEASUREMENT DEVICE
A system for measuring a temperature of a rotating workpiece comprises a deposition chamber, a crucible within the deposition chamber, an energy source, a...
2018/0226221 WIDE FIELD ATOMOSPHERIC SCANNING ELECTRON MICROSCOPE
Atmospheric scanning electron microscope achieves a wide field of view at low magnifications in a broad range of gaseous pressure, acceleration voltage and...
2018/0226220 CONTINUOUSLY VARIABLE APERTURE
An apparatus for a transmission electron microscope includes a housing configured to be attached to the transmission electron microscope; a plunger received in...
2018/0226219 Multi-Column Scanning Electron Microscopy System
A multi-column scanning electron microscopy (SEM) system includes a column assembly, where the column assembly includes a first substrate array assembly and at...
2018/0226218 REPELLER, CATHODE, CHAMBER WALL AND SLIT MEMBER FOR ION IMPLANTER AND ION GENERATING DEVICES INCLUDING THE SAME
Provided are elements for an ion implanter and an ion generating device including the same. The elements include a repeller, a cathode, a chamber wall, and a...
2018/0226217 HALL CURRENT PLASMA SOURCE HAVING A CENTER-MOUNTED CATHODE OR A SURFACE-MOUNTED CATHODE
A miniature Hall current plasma source apparatus having magnetic shielding of the walls from ionized plasma, an integrated discharge channel and gas...
2018/0226216 SENSOR POSITIONING AND INSTALLATION FIXTURE
An apparatus for positioning and attaching one or more sensor devices to a surface of an electrical component is described. The apparatus comprises one or more...
2018/0226215 SELF-POWERED SWITCHES AND RELATED METHODS
Self-powered switches include an externally accessible user input member, a switch housing attached to the user input member, a permanent magnet held in the...
2018/0226214 Gas Breaker
There is provided a gas circuit breaker that includes: a puffer shaft connected to one of a pair of arcing contacts, a puffer cylinder that is coaxially...
2018/0226213 Electric Power Distribution Switchgear And Method Of Breaking An Electric Power Current
An electric power distribution switchgear is connected between an electric power grid and an electric power equipment. The switchgear includes a synchronized...
2018/0226212 ROCKER SWITCH DEVICE
A rocker switch device includes an operation knob with a close bottom cylindrical shape configured to be operated, a body including a contact point configured...
2018/0226211 KEYBOARD SWITCH
A keyboard switch includes a base, a static contact, a movable contact, an upper cover, a button and a reset spring; the upper cover is buckled to the base;...
2018/0226210 KEYCAP WITH ACTIVE ELEMENTS
Particular embodiments described herein provide for a keycap. The keycap can include a protective layer and an active element, where the height of protective...
2018/0226209 ELECTRONIC SWITCH AND REMOTE CONTROL DEVICE INCLUDING ELECTRONIC SWITCH
An electronic switch includes a rubber sheet that includes a first surface, a second surface opposite to the first surface, and a convex portion on the first...
2018/0226208 Direct-Current Switching Device
A direct-current switching device for interrupting an electric direct current flowing along a medium or high-voltage current path, includes an electric circuit...
2018/0226207 INTERLOCKING DEVICE FOR CIRCUIT BREAKER
An interlocking device for a circuit breaker comprises a control assembly and an interlocking assembly which are connected with each other in a driving manner....
2018/0226206 CIRCUIT BREAKER ENERGY STORAGE OPERATING MECHANISM
An energy storage operation mechanism for a circuit breaker comprises a side plate assembly, a connecting rod assembly, a cam assembly, an energy storage...
2018/0226205 ELECTRODE PRODUCTION METHOD
In a case where an electrode manufacturing operation such as heat treatment is performed on a rectangular plate-like electrode substrate that is suspended by a...
2018/0226204 Hybrid Capacitor and Method of Manufacturing a Capacitor
An improved capacitor is described herein. The capacitor comprises a working element wherein the working element comprises an anode comprising a dielectric...
2018/0226203 LIGHT-ABSORBING MATERIAL CONTAINING PEROVSKITE COMPOUND, AND PEROVSKITE SOLAR CELL INCLUDING THE SAME
A light-absorbing material contains a perovskite compound represented by the composition formula HC(NH.sub.2).sub.2PbI.sub.3. The .sup.1H-NMR spectrum, which...
2018/0226202 LIGHT-ABSORBING MATERIAL CONTAINING PEROVSKITE COMPOUND AND PEROVSKITE SOLAR CELL INCLUDING THE SAME
A light-absorbing material contains a perovskite compound represented by the composition formula CH.sub.3NH.sub.3PbI.sub.3. The .sup.1H-NMR spectrum, which is...
2018/0226201 ISODIKETOPYRROLOPYRROLE DYE AND USE THEREOF
The present invention discloses an isodiketopyrrolopyrrole dye and use thereof. A series of pure organic dye based on isodiketopyrrolopyrrole are synthesized...
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