Easy To Use Patents Search & Patent Lawyer Directory

At Patents you can conduct a Patent Search, File a Patent Application, find a Patent Attorney, or search available technology through our Patent Exchange. Patents are available using simple keyword or date criteria. If you are looking to hire a patent attorney, you've come to the right place. Protect your idea and hire a patent lawyer.

Searching:





Search by keyword, patent number, inventor, assignee, city or state:




Patent # Description
2018/0240682 ATOMIC LAYER ETCH OF TUNGSTEN FOR ENHANCED TUNGSTEN DEPOSITION FILL
Methods of depositing tungsten into high aspect ratio features using a dep-etch-dep process integrating various deposition techniques with alternating pulses...
2018/0240681 HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS OF LIGHT IRRADIATION TYPE
When pressure in a chamber is once reduced lower than that when a flash of light is emitted and is maintained, after a flash lamp irradiates a semiconductor...
2018/0240680 USE OF NON-OXIDIZING STRONG ACIDS FOR THE REMOVAL OF ION-IMPLANTED RESIST
A method and composition for removing bulk and/or ion-implanted resist material from microelectronic devices have been developed. The compositions effectively...
2018/0240679 Hard Mask Removal Method
A method of removing a hard mask is provided. Gate stacks are patterned on a substrate, where the gate stacks include a polysilicon layer and the hard mask...
2018/0240678 ELEMENT CHIP AND MANUFACTURING PROCESS THEREOF
Provided is a manufacturing process of an element chip, which comprises a preparation step, a setting step for setting the substrate on a stage, and a...
2018/0240677 GAS REACTION TRAJECTORY CONTROL THROUGH TUNABLE PLASMA DISSOCIATION FOR WAFER BY-PRODUCT DISTRIBUTION AND ETCH...
Methods, systems, and computer programs are presented for controlling gas flow in a semiconductor manufacturing chamber. The method includes flowing a reactant...
2018/0240676 Enhanced Spatial ALD Of Metals Through Controlled Precursor Mixing
Methods of depositing a film by atomic layer deposition are described. The methods comprise exposing a substrate surface to a first process condition...
2018/0240675 FORMING LOW RESISTIVITY FLUORINE FREE TUNGSTEN FILM WITHOUT NUCLEATION
Methods of depositing fluorine-free tungsten by sequential CVD pulses, such as by alternately pulsing a fluorine-free tungsten precursor and hydrogen in cycles...
2018/0240674 PASSIVATION OF GERMANIUM SURFACES
Compositions useful for the passivation of germanium-containing materials on a microelectronic device having same thereon.
2018/0240673 TRANSISTOR, PROTECTION CIRCUIT, AND METHOD OF MANUFACTURING TRANSISTOR
Both an improvement of on-current and suppression of leakage current of a transistor are achieved. A transistor includes a drain, a source, a gate, and a gate...
2018/0240672 Semiconductor Device Having a Device Doping Region of an Electrical Device Arrangement
A semiconductor device includes a device doping region of an electrical device arrangement disposed in a semiconductor substrate. A portion of the device...
2018/0240671 LIQUID PHASE EPITAXY DOPING AND SILICON PN JUNCTION PHOTOVOLTAIC DEVICES
A method for forming a doped silicon layer or a silicon alloy includes providing a silicon substrate having a silicon surface. An eutectic-former layer with...
2018/0240670 DAMAGE FREE ENHANCEMENT OF DOPANT DIFFUSION INTO A SUBSTRATE
A method of doping a substrate. The method may include implanting a dose of a helium species into the substrate through a surface of the substrate at an...
2018/0240669 METHODS OF FABRICATING A SEMICONDUCTOR DEVICE
Methods of fabricating a semiconductor device are provided. The methods may include forming a hard mask film on a lower film and forming first spacers on the...
2018/0240668 Semiconductor Mask Blanks with a Compatible Stop Layer
A mask for semiconductor manufacturing includes a mask substrate, a shifter layer over the mask substrate, a stop layer over and in contact with the shifter...
2018/0240667 TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING
Tin oxide films are used as spacers and hardmasks in semiconductor device manufacturing. In one method, tin oxide layer is formed conformally over sidewalls...
2018/0240666 VARIABLE FREQUENCY MICROWAVE (VFM) PROCESSES AND APPLICATIONS IN SEMICONDUCTOR THIN FILM FABRICATIONS
Methods and apparatus for processing a substrate are described herein. A vacuum multi-chamber deposition tool can include a degas chamber with both a heating...
2018/0240665 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
There is provided a technique which includes: forming a first film containing silicon, oxygen, carbon and nitrogen on a substrate by performing a first cycle a...
2018/0240664 REMOTE PLASMA BASED DEPOSITION OF GRADED OR MULTI-LAYERED SILICON CARBIDE FILM
Provided are methods and apparatuses for depositing a graded or multi-layered silicon carbide film using remote plasma. A graded or multi-layered silicon...
2018/0240663 CESIUM PRIMARY ION SOURCE FOR SECONDARY ION MASS SPECTROMETER
A primary ion source subassembly for use with a secondary ion mass spectrometer may include a unitary graphite ionizer tube and reservoir base. A primary ion...
2018/0240661 Plasma Generator Assembly for Mass Spectroscopy
A plasma unit for a mass spectroscopy machine generates plasma using a microwave coupled dielectric ring held within a microwave cavity employing part of the...
2018/0240660 MASS SPECTROMETER
A mass spectrometer for performing a selected ion monitoring (SIM) measurement and/or multiple reaction monitoring (MRM) measurement on each of one or a...
2018/0240659 METHOD FOR IDENTIFICATION OF THE ELEMENTAL COMPOSITION OF SPECIES OF MOLECULES
Methods of identification of at least one most likely elemental composition of at least one species of molecules contained in a sample and/or originated from a...
2018/0240658 Deconvolution of Mixed Spectra
An m/z range of an ion beam is divided into two or more precursor ion mass selection windows. A pattern of two or more different window m/z ranges to be used...
2018/0240657 COLLISION CELL HAVING AN AXIAL FIELD
The invention provides a mass spectrometer that comprises a collision cell having an axial electric field that enhances transmission of light ions, especially...
2018/0240656 Hybrid Filtered Arc-Magnetron Deposition Method, Apparatus And Applications Thereof
A hybrid filtered arc-magnetron sputtering deposition apparatus includes a coating chamber including a substrate holder for holding a substrate to be coated, a...
2018/0240655 METHODS AND APPARATUS FOR MULTI-CATHODE SUBSTRATE PROCESSING
Methods and apparatus for processing substrates with a multi-cathode chamber. The multi-cathode chamber includes a shield with a plurality of holes and a...
2018/0240654 SYSTEMS AND METHODS FOR INTERNAL SURFACE CONDITIONING ASSESSMENT IN PLASMA PROCESSING EQUIPMENT
In an embodiment, a plasma source includes a first electrode, configured for transfer of one or more plasma source gases through first perforations therein; an...
2018/0240653 FABRICATION OF OPTICAL METASURFACES
The method is provided for fabricating an optical metasurface. The method may include depositing a conductive layer over a holographic region of a wafer and...
2018/0240652 Temperature Control Using Temperature Control Element Coupled to Faraday Shield
Plasma processing apparatus and methods are disclosed. In one example implementation, a plasma processing apparatus can include a processing chamber. The...
2018/0240651 FOCUS RING AND PLASMA PROCESSING APPARATUS
A focus ring to be detachably attached to a top surface of an outer peripheral portion of a mounting table in a processing chamber, includes: an annular main...
2018/0240650 PLASMA PROCESSING APPARATUS AND UPPER ELECTRODE ASSEMBLY
A plasma processing apparatus includes supporting members, connecting members and a sliding member. Each of the supporting members is partially disposed in a...
2018/0240649 SURFACE COATING FOR PLASMA PROCESSING CHAMBER COMPONENTS
A method for forming a protective coating for a component of plasma processing chamber is provided. A first ceramic coating is plasma sprayed over a surface of...
2018/0240648 MULTI-LAYER PLASMA RESISTANT COATING BY ATOMIC LAYER DEPOSITION
Described herein are articles, systems and methods where a plasma resistant coating is deposited onto a surface of a chamber component using an atomic layer...
2018/0240647 SYSTEMS AND METHODS FOR TUNING TO REDUCE REFLECTED POWER IN MULTIPLE STATES
Systems and methods for tuning to reduce reflected power in multiple states are described. The methods include determining values of one or more parameters of...
2018/0240646 ION BEAM PROCESSING DEVICE
The present invention has an objective to provide a processing method and an ion beam processing apparatus capable of inhibiting deposition of redeposited...
2018/0240645 LOAD LOCK SYSTEM FOR CHARGED PARTICLE BEAM IMAGING
A load lock system for charged particle beam imaging with a particle shielding plate, a bottom seal plate and a plurality of sensor units is provided. The...
2018/0240644 Scanning Electron Microscope
A scanning electron microscope includes: a liner tube which transmits an electron beam; a scintillator having a through-hole into which the liner tube is...
2018/0240643 Electron Microscope
The objective of the present invention is to simultaneously achieve image observations at a high resolution using an electron microscope, and X-ray analysis at...
2018/0240642 METHOD AND APPARATUS FOR TRANSMISSION ELECTRON MICROSCOPY
The disclosure is related to a method and apparatus for transmission electron microscopy wherein a TEM specimen is subjected to at least one thinning step by...
2018/0240641 CHARGED PARTICLE BEAM APPARATUS AND ALIGNMENT ADJUSTMENT METHOD OF SAMPLE STAGE
An object of the invention relates to the fact that the alignment of the sample stage and the optical image can be adjusted with high accuracy, good...
2018/0240640 Electron Source Architecture for a Scanning Electron Microscopy System
A scanning electron microscopy (SEM) system includes a plurality of electron-optical columns and a plurality of electron beam sources. The electron beam...
2018/0240639 ELECTRON ENERGY LOSS SPECTROMETER USING DIRECT DETECTION SENSOR
An electron energy loss spectrometer is described having a direct detection sensor, a high speed shutter and a sensor processor wherein the sensor processor...
2018/0240638 METHOD FOR PROACTIVE MITIGATION OF CORONAL DISCHARGE AND FLASH-OVER EVENTS WITHIN HIGH VOLTAGE X-RAY GENERATORS...
A control mechanism for a high-voltage generator that provides voltage and current to an electronic radiation source in a high-temperature environment is...
2018/0240637 Graphene/Graphite-Based Filament for Thermal Ionization
Methods and systems for thermal ionization of a sample and formation of an ion beam are described. The systems incorporate a thermal ionization filament that...
2018/0240636 CIRCUIT BREAKER TRIPPING MECHANISM
A tripping mechanism for a circuit breaker comprises a connecting rod assembly and a control assembly, wherein one end of the connecting rod assembly is...
2018/0240635 SYSTEMS, APPARATUS, AND METHODS FOR ACCESSORY TRIPPING AND RESETTING OF ELECTRIC CIRCUIT BREAKERS
Systems, apparatus, and methods for accessory tripping and resetting of circuit breakers are disclosed. Embodiments of the invention include a breaker handle;...
2018/0240634 CIRCUIT BREAKER HAVING CIRCUIT OPERATING DEVICE
A circuit breaker having a circuit operating device according to one embodiment of the present invention includes a circuit unit having a main circuit, a...
2018/0240633 MOUNTING STRUCTURE FOR ENERGY STORAGE ASSEMBLY OF CIRCUIT BREAKER
A mounting structure for an energy storage assembly of a circuit breaker comprises an energy storage lever and an energy storage spring, wherein one end of the...
2018/0240632 SWITCHGEAR FOR AN ELECTRIC CURRENT WITH SEPARABLE ELECTRICAL CONTACTS AND WITH AIR SWITCHING
A switchgear for an electric current includes a switching assembly that can be switched between an open state and a closed state; a control mechanism including...
← Previous | 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 58 59 60 61 62 63 64 65 66 67 68 69 70 71 72 73 74 75 76 77 78 79 80 81 82 83 84 85 86 87 88 89 90 91 92 93 94 95 96 97 98 99 100 101 102 103 104 105 106 107 108 109 110 111 112 113 114 115 116 117 118 119 120 121 122 123 124 125 126 127 128 129 130 131 132 133 134 135 136 137 138 139 140 141 142 143 144 145 146 | Next →

File A Patent Application

  • Protect your idea -- Don't let someone else file first. Learn more.

  • 3 Easy Steps -- Complete Form, application Review, and File. See our process.

  • Attorney Review -- Have your application reviewed by a Patent Attorney. See what's included.