Easy To Use Patents Search & Patent Lawyer Directory

At Patents you can conduct a Patent Search, File a Patent Application, find a Patent Attorney, or search available technology through our Patent Exchange. Patents are available using simple keyword or date criteria. If you are looking to hire a patent attorney, you've come to the right place. Protect your idea and hire a patent lawyer.

Searching:





Search by keyword, patent number, inventor, assignee, city or state:




Patent # Description
2018/0247848 VACUUM ADSORPTION UNIT AND VACUUM ADSORPTION CARRIER
The present disclosure discloses a vacuum adsorption unit and a vacuum adsorption carrier, wherein the vacuum adsorption unit comprises: a housing defining an...
2018/0247847 METHOD AND STATION FOR MEASURING THE CONTAMINATION OF A TRANSPORT BOX FOR THE ATMOSPHERIC CONVEYANCE AND...
A method for measuring contamination of a transport box for atmospheric conveyance and storage of substrates is provided, the method including: measuring a...
2018/0247846 PURGE DEVICE, PURGE STOCKER, AND PURGE METHOD
A purge device capable of appropriately purging a container in accordance with a type of a container includes a type detector that detects a type of a...
2018/0247845 Substrate Carrier
A substrate carrier includes a substrate carrier plate having a front-sided substrate carrier surface on which at least one substrate receiving area is...
2018/0247844 LED DISPLAY DEVICE, MOLDING MODULE, AND PREPARATION METHOD THEREOF
An LED display device includes a substrate and an LED encapsulation unit disposed on a side of the substrate, the LED encapsulation unit includes an LED stent...
2018/0247843 HEATER CLEANING METHOD
A substrate processing apparatus includes a heater having an infrared lamp and a housing for heating an upper surface of a substrate held by a substrate...
2018/0247842 APPARATUS FOR THERMAL TREATMENT OF A SUBSTRATE, CARRIER AND SUBSTRATE SUPPORT ELEMENT
An apparatus for thermal treatment of a substrate is provided. The apparatus has a heating device and a carrier provided with a support surface for the...
2018/0247841 SUBSTRATE LIQUID PROCESSING APPARATUS
A substrate liquid processing apparatus includes a processing tub 34A which is configured to store therein a processing liquid in a boiling state and in which...
2018/0247840 APPARATUS AND METHOD FOR TRANSFERRING A SUBSTRATE
Apparatus and method for transferring a substrate are disclosed. The substrate transfer apparatus includes: a substrate conveyance assembly disposed between a...
2018/0247839 SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
A substrate treatment apparatus according to the present invention is provided with a first tank that stores treatment liquid for treating a substrate and a...
2018/0247838 Methods and Systems for Chemical Mechanical Polish Cleaning
Methods for cleaning integrated circuit (IC) wafers after undergoing planarization processes (for example, chemical mechanical polishing processes) and...
2018/0247837 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
A substrate processing method includes a replacing step of replacing the processing liquid with a low surface tension liquid, a liquid film forming step of...
2018/0247836 REMOVAL APPARATUS FOR REMOVING RESIDUAL GAS AND SUBSTRATE TREATING FACILITY INCLUDING THE SAME
A removal apparatus for removing residual gases and a substrate treating facility for removing residual gases is disclosed. The residual gas removal apparatus...
2018/0247835 NOZZLE, SUBSTRATE TREATING APPARATUS INCLUDING THE SAME, AND SUBSTRATE TREATING METHOD
The present invention provides a substrate treating apparatus. The substrate treating apparatus includes a chamber configured to provide a space for processing...
2018/0247834 METHOD FOR MANUFACTURING SEMICONDUCTOR APPARATUS
This is to provide a method for manufacturing a semiconductor apparatus which can shorten the manufacturing process of a semiconductor device, particularly a...
2018/0247833 METHOD FOR FABRICATING ARRAY SUBSTRATE
A method for fabricating an array substrate is disclosed. The method comprises: forming a first oxide semiconductor active layer of a first TFT in a GOA area...
2018/0247832 CONTROL OF DIRECTIONALITY IN ATOMIC LAYER ETCHING
A method for performing atomic layer etching (ALE) on a substrate is provided, including the following operations: performing a surface modification operation...
2018/0247831 METHOD FOR ULTRA-SHALLOW ETCHING USING NEUTRAL BEAM PROCESSING BASED ON GAS CLUSTER ION BEAM TECHNOLOGY
A method for shallow etching a substrate surface forms a shallow modified substrate layer overlying unmodified substrate using an accelerated neutral beam and...
2018/0247830 METHOD FOR MANUFACTURING SILICON WAFER
A method for manufacturing a silicon wafer having a denuded zone in a surface layer by performing a heat treatment to a silicon wafer, including: a step A,...
2018/0247829 FINFET DOPING METHODS AND STRUCTURES THEREOF
A method and structure for providing conformal doping of FinFET fin structures, for example by way of a thermal treatment process, includes forming a gate...
2018/0247828 SYSTEMS FOR PERFORMING IN-SITU DEPOSITION OF SIDEWALL IMAGE TRANSFER SPACERS
A system for performing a sidewall image transfer process includes a substrate processing chamber configured to process a substrate including a mandrel layer....
2018/0247827 SEMICONDUCTOR MANUFACTURING METHOD AND PLASMA PROCESSING APPARATUS
A semiconductor manufacturing method includes a first process of etching an insulating film over a conductive layer of an object into a pattern of a mask, and...
2018/0247826 PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
A processing method including a first step of supplying a first gas including a carbon-containing gas and an inert gas into an inside of a chamber and a second...
2018/0247825 ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION
A method for forming fins includes forming a three-color hardmask fin pattern on a fin base layer. The three-color hardmask fin pattern has hardmask fins of...
2018/0247824 ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION
A method for forming fins includes forming a three-color hardmask fin pattern on a fin base layer. The three-color hardmask fin pattern has hardmask fins of...
2018/0247822 Method Of Fabricating A Semiconductor Wafer Including A Through Substrate Via (TSV) And A Stepped Support Ring...
A semiconductor wafer having a plurality of through substrate vias (TSVs) is disclosed. The semiconductor wafer includes a stepped support ring on an outer...
2018/0247821 Tungsten Deposition Without Barrier Layer
Methods for depositing a metal film without the use of a barrier layer are disclosed. Some embodiments comprise forming an amorphous nucleation layer...
2018/0247820 Controlling the Reflow Behaviour of BPSG Films and Devices Made Thereof
A method for depositing an insulating layer includes performing a primary deposition over a sidewall of a feature by depositing a layer of silicate glass using...
2018/0247819 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS
Provided is a technique of adjusting a work function. A method of manufacturing a semiconductor device includes forming a film having a predetermined thickness...
2018/0247818 AUTOMATIC INSPECTION DEVICE AND METHOD OF LASER PROCESSING EQUIPMENT
Provided is an automatic inspection device and method for inspecting processing quality of laser processing equipment that forms a modified area by irradiating...
2018/0247817 EPITAXIAL SUBSTRATE FOR SEMICONDUCTOR ELEMENTS, SEMICONDUCTOR ELEMENT, AND MANUFACTURING METHOD FOR EPITAXIAL...
Provided is an epitaxial substrate for semiconductor elements which suppresses an occurrence of current collapse. The epitaxial substrate for the semiconductor...
2018/0247816 FUNCTIONALIZED GRAPHENE STRUCTURE AND METHOD FOR MANUFACTURING THE SAME
A method for manufacturing a functionalized graphene structure includes preparing a substrate having a graphene layer, forming an organic linker layer by...
2018/0247815 METHODS OF FORMING STRUCTURES AND METHODS OF DECREASING DEFECT DENSITY
A method of forming a structure comprises forming a pattern of self-assembled nucleic acids over a material. The pattern of self-assembled nucleic acids is...
2018/0247814 Method for Defining Patterns for Conductive Paths in a Dielectric Layer
An example embodiment may include a method for defining patterns for conductive paths in a dielectric layer. The method may include (a) forming a mask layer on...
2018/0247813 TECHNOLOGIES FOR INVERTING LITHOGRAPHIC PATTERNS AND SEMICONDUCTOR DEVICES INCLUDING HIGH ASPECT RATIO STRUCTURES
Technologies for inverting lithographic patterns are described. In some embodiments the technologies include a method for inverting a lithographic pattern of...
2018/0247812 DEFECT-FREE HETEROGENEOUS SUBSTRATES
In example implementations of a heterogeneous substrate, the heterogeneous substrate includes a first material having an air trench, a second material coupled...
2018/0247811 Composition and Method for Making Picocrystalline Artificial Borane Atoms
Materials containing picocrystalline quantum dots that form artificial atoms are disclosed. The picocrystalline quantum dots (in the form of born icosahedra...
2018/0247810 EPITAXIAL SUBSTRATE FOR SEMICONDUCTOR ELEMENTS, SEMICONDUCTOR ELEMENT, AND MANUFACTURING METHOD FOR EPITAXIAL...
Provided is an epitaxial substrate for semiconductor elements which suppresses an occurrence of current collapse. The epitaxial substrate for the semiconductor...
2018/0247809 EPITAXIAL SUBSTRATE FOR SEMICONDUCTOR ELEMENTS, SEMICONDUCTOR ELEMENT, AND MANUFACTURING METHOD FOR EPITAXIAL...
Provided is an epitaxial substrate for semiconductor elements which suppresses an occurrence of current collapse. The epitaxial substrate for the semiconductor...
2018/0247808 DIELECTRIC-METAL STACK FOR 3D FLASH MEMORY APPLICATION
A method is provided for forming a stack of film layers for use in 3D memory devices. The method starts with providing a substrate in a processing chamber of a...
2018/0247807 TOUCH SUBSTRATE AND FABRICATION METHOD THEREOF, AND ELECTRONIC DEVICE
Embodiments of the present disclosure provide a touch substrate and a fabrication method thereof, and an electronic device. The fabrication method of the touch...
2018/0247806 Sulfur Plasma Lamp
A sulfur plasma lamp has a lamp envelope of transparent or translucent glass or ceramic material. At least two silicon carbide electrodes are hermetically...
2018/0247805 SPECTROMETRY METHOD AND SPECTROMETER DEVICE
A spectrometer device for analysis of aerosol particles, dusts, and other microparticles and/or nanoparticles includes an electrospray ionization source...
2018/0247804 ATMOSPHERIC-PRESSURE IONIZATION AND FRAGMENTATION OF MOLECULES FOR STRUCTURAL ELUCIDATION
A solution-cathode glow discharge (SCGD) spectrometry apparatus may comprise an SCGD source and a mass or ion mobility spectrometer. A method for ionizing a...
2018/0247803 MASS SPECTROMETRY BY DETECTING POSITIVELY AND NEGATIVELY CHARGED PARTICLES
The disclosure features mass spectrometry systems and methods that include an ion source, an ion trap, a detector subsystem featuring first and second detector...
2018/0247802 MICROCHANNEL PLATE AND ELECTRON MULTIPLIER
A microchannel plate is provided with a substrate including a front surface, a rear surface, and a side surface, a plurality of channels penetrating from the...
2018/0247801 GALLIUM IMPLANTATION CLEANING METHOD
A method is presented for cleaning an ion implanter during operation of the ion implanter. The method includes generating a gallium (III) iodide (GaI.sub.3)...
2018/0247800 GALLIUM IMPLANTATION CLEANING METHOD
A method is presented for cleaning an ion implanter during operation of the ion implanter. The method includes generating a gallium (III) iodide (GaI.sub.3)...
2018/0247799 DEPOSITION APPARATUS AND PHYSICAL VAPOR DEPOSITION CHAMBER
The present disclosure provides a deposition apparatus, including a first chamber, a second chamber and a third chamber. The first chamber is configured to...
2018/0247798 System Implementing Machine Learning in Complex Multivariate Wafer Processing Equipment
A system for controlling processing state of a plasma process is provided. One example system includes a plasma reactor having a plurality of tuning knobs for...
← Previous | 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 58 59 60 61 62 63 64 65 66 67 68 69 70 71 72 73 74 75 76 77 78 79 80 81 82 83 84 85 86 87 88 89 90 91 92 93 94 95 96 97 98 99 100 101 102 103 104 105 106 107 108 109 110 111 112 113 114 115 116 117 118 119 120 121 122 123 124 125 126 127 128 129 130 131 132 133 134 135 136 137 138 139 140 141 | Next →

File A Patent Application

  • Protect your idea -- Don't let someone else file first. Learn more.

  • 3 Easy Steps -- Complete Form, application Review, and File. See our process.

  • Attorney Review -- Have your application reviewed by a Patent Attorney. See what's included.