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Patent # Description
US-5,466,671 Apidaecin-type peptide antibiotics with improved activities and/or different antibacterial spectrum
This invention provides a purified polypeptide having antibacterial activity comprising a first sequence Pro-Arg-Pro-Pro-His-Pro-Arg-X1, wherein X1 is Ile or...
US-5,466,670 Use of IGF-1
The invention relates to the use of IGF-1 for the manufacture of a medicament for treatment of Type 1 diabetes mellitus. the medicament comprising a subcutaneous...
US-5,466,669 Immunostimulatory agent
There is disclosed an immunostimulatory agent comprising a peptide derived from lactoferrin having activity to modulate the release of inflammatory mediators...
US-5,466,668 Superior thrombomodulin analogs for pharmaceutical use
The present invention relates to the use of analogs of thrombomodulin ("TM") that have the ability to enhance the thrombin-mediated activation of protein C but...
US-5,466,667 Prophylactic and therapeutic methods for treating edema with antamanides
Unique methods for treating edemas in living subjects are provided comprising administering an effective amount of an antamanide or an antamanide analogue to the...
US-5,466,666 Amorphous monospheric forms of insulin derivatives
A process for the production of an amorphous monospheric form of insulin derivatives is described, wherein the insulin derivative is dissolved in an...
US-5,466,665 Method of manufacturing Y-Ba-Cu-O superconducting thin film
A method of manufacturing YBCO superconducting thin films is obtained which is capable of providing superconducting thin films having excellent crystallinity in...
US-5,466,664 Method for manufacturing a superconducting device having a thin superconducting channel formed of oxide...
A method of manufacturing a superconducting device involves forming a thin film on the surface of a substrate, forming a superconducting gate electrode on a...
US-5,466,663 Tetrahydrophthalimide derivatives and their use as herbicides
There is disclosed a compound of the formula: ##STR1## wherein X is hydrogen or halogen; Y is halogen; Z is oxygen or sulfur; R.sup.1 is hydrogen or alkyl;...
US-5,466,662 Use of 4-chloro-3-(4-chloro-2-fluorophenyl)-5-difluoromethoxy-1-methyl-1H-pyraz ole as an herbicidal treatment
A method for killing or controlling weeds in a soya crop, which method comprises applying to the crop or to the location thereof a compound of formula (I): ...
US-5,466,661 Benzaldehyde oxime derivatives, production and use thereof
The present invention relates to novel benzaldehyde derivatives, specifically .alpha.-azolyl-2-substituted benzaldehyde oxime derivatives, their production, and...
US-5,466,660 Tetrazolinones as herbicides for use in paddy
Compositions comprising herbicidal tetrazolinones of the formula (I) ##STR1## wherein X is chlorine or bromine, Y is hydrogen, chlorine, bromine, methyl or...
US-5,466,659 Triclopyr butoxyethyl ester compositions comprising vegetable oil esters as carriers
This invention relates to novel triclopyr butoxyethyl ester (triclopyr BEE) compositions comprising the use of esters of vegetable oils as carriers in triclopyr...
US-5,466,658 Thermal dye transfer receiving element for mordanting ionic dyes
A dye-receiving element for receiving a thermally-transferred ionic dye comprising a support having thereon a dye image-receiving layer, wherein the dye...
US-5,466,657 Heat transfer image-receiving sheets
The present invention provides a heat transfer image-receiving sheet showing improved releasability at the time of heat-sensitive printing, which includes a...
US-5,466,656 Heat sensitive recording material
The present invention provides a heat sensitive recording material comprising a recording layer formed on a substrate and containing a colorless or light-colored...
US-5,466,655 Heat-sensitive recording material
A heat-sensitive recording material comprising a support and a heat-sensitive recording layer containing a leuco dye and a developer, formed on one side of the...
US-5,466,654 Erasable display medium
A display medium is disclosed, comprising at least the following layers, in this order: a heating resistive layer, a conductive layer, a background layer and an...
US-5,466,653 Method for preparing negative-working wash-off relief images and non-photosensitive elements for use therein
A method for preparing high resolution, negative-working, wash-off relief images, preferably using ink jet printing, comprising the sequential steps of: (a)...
US-5,466,652 Process for the preparation of vinyl acetate catalyst
A process for the manufacture of a Pd/Au/alkali metal catalyst, preferably a fluid bed catalyst used in the production of vinyl acetate comprising impregnating a...
US-5,466,651 Catalytic method
A catalytic article for use in catalytic chemical conversions, which comprises; a metal monolith catalyst support and a catalytically active surfacey layer...
US-5,466,650 Catalyst for the dehalogenation of alphahalogenated carboxylic acids and its use for purifying monochloroacetic...
The invention relates to a catalyst formed of an active charcoal support in the form of particles or of cylinders having a diameter from 0.3 to 1.5 mm and a...
US-5,466,649 Polymerization catalyst systems, their production and use
This invention is generally directed toward a catalyst system useful for polymerizing olefins. The catalyst system of this invention comprises a supported bulky...
US-5,466,648 Supported alpha-olefin dimerization catalyst
The present invention is directed to a supported tungsten-based catalyst composition useful for the dimerization of alpha-olefins including ethylene. More...
US-5,466,647 Tertiary amino-aluminoxane halides
Novel tertiary amine-aluminoxane halide derivatives are disclosed along with olefin polymerization catalyst and polymerization processes using such derivatives...
US-5,466,646 Process for the preparation of solid state materials and said materials
A process for the preparation of solid state materials such as catalysts, electrolytes, piezo electric materials and superconductors is disclosed. The process...
US-5,466,645 Method for reactivating nitrogen-treated carbon catalysts
A method is provided for the restoration of catalytic activity in deactivated nitrogen-treated carbon catalysts. Nitrogen-treated carbon catalysts are those...
US-5,466,644 Reactivation of water-soluble hydroformylation catalysts
A process for regenerating a water-soluble hydroformylation catalyst system comprising a coupler rhodium hydrogen-carbonyl complex of rhodium and compounds of...
US-5,466,643 High zirconia fused cast refractories
High zirconia fused cast refractories which include as chemical components of refractories in weight %, 85 through 91% of ZrO.sub.2, 7.0 through 11.2% of...
US-5,466,642 Wear resistant cubic-boron-nitride-based cutting tool
A wear resistant C-BN-based cutting tool superior in toughness includes a specified amount of at least one of a Ti carbide/nitride component, a compound...
US-5,466,641 Process for forming polycrystalline silicon film
An object of this invention is to provide a process for forming a practical polycrystalline silicon film of large crystal grain diameters, which is for use in...
US-5,466,640 Method for forming a metal wire of a semiconductor device
The object of the present invention is to prevent the electrical short between the adjacent metal wires by forming metal wires alternately between insulation...
US-5,466,639 Double mask process for forming trenches and contacts during the formation of a semiconductor memory device
A method of forming contact to a semiconductor memory device feature comprises the steps of forming a first oxide layer over a feature such as a semiconductor...
US-5,466,638 Method of manufacturing a metal interconnect with high resistance to electromigration
A semiconductor device is provided which includes a conductive layer, an insulating film formed on the surface of the conductive layer, and a conductive metal...
US-5,466,637 Method of making a self-aligned contact in semiconductor device
A method of making a self-aligned contact in a semiconductor device has some advantages in that the increasing tolerance of contact mask for following the...
US-5,466,636 Method of forming borderless contacts using a removable mandrel
A semiconductor fabrication process for forming borderless contacts (130, 170, 172) using a removable mandrel (110). The process involves depositing a mandrel on...
US-5,466,635 Process for making an interconnect bump for flip-chip integrated circuit including integral standoff and...
An interconnect bump is formed on a substrate structure of a flip-chip microelectronic integrated circuit by sputtering a metal base layer on the substrate, and...
US-5,466,634 Electronic modules with interconnected surface metallization layers and fabrication methods therefore
Methods of fabrication for electronic modules having electrically interconnected side and end surface metallization layers and associated electronic modules are...
US-5,466,633 Optical reading head and method for making same
An article and method for manufacturing an optical reading head (400,500) including an optically transparent substrate (100) with a first surface (103) and a...
US-5,466,632 Field oxide with curvilinear boundaries and method of producing the same
A method of forming field oxides with curvilinear boundaries between active regions on a substrate in an integrated circuit (IC) so that the stresses induced in...
US-5,466,631 Method for producing semiconductor articles
A method for producing a semiconductor article comprises the steps of preparing a first substrate having a non-porous semiconductor layer on a porous...
US-5,466,630 Silicon-on-insulator technique with buried gap
An silicon-on-insulator (SOI) isolation structure of a silicon substrate, which has a buried gap between active regions and the substrate, and supporting pillars...
US-5,466,629 Process for fabricating ferroelectric integrated circuit
An oversize ferroelectric capacitor is located against the contact hole to the MOSFET source/drain in a DRAM. A barrier layer made of titanium nitride, titanium...
US-5,466,628 Method of manufacturing trench capacitor with a recessed field oxide layer
A capacitor of a semiconductor device has a plate electrode which process margin and a method of manufacturing same are disclosed. The plate electrode has a...
US-5,466,627 Stacked capacitor process using BPSG precipitates
A MOST capacitor for use in a DRAM is formed by using BPSG precipitates after densification as a mask for etching a BPSG layer to form BPSG islands. The BPSG...
US-5,466,626 Micro mask comprising agglomerated material
The subject invention provides a method of forming recesses in a substrate such as a capacitor so as to increase the surface area thereof and therefore the...
US-5,466,625 Method of making a high-density DRAM structure on SOI
A high density, DRAM cell array with a very short channel, vertical gate transfer transistor that can be manufactured using conventional photolithography process...
US-5,466,624 Isolation between diffusion lines in a memory array
A method of forming a memory device with improved isolation between diffusion lines. Parallel, spaced apart thick oxide strips are grown on a substrate. Next,...
US-5,466,623 Method of making semiconductor integrated circuit having isolation oxide regions with different thickness
A method of manufacturing a semiconductor memory device having a peripheral circuit portion, the operating voltage of which is relatively high and a memory array...
US-5,466,622 Process for fabricating integrated devices including nonvolatile memories and transistors with tunnel oxide...
A process for simultaneously fabricating memory cells, transistors, and diodes for protecting the tunnel oxide layer of the cells, using the DPCC process wherein...
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