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Patent # Description
US-5,527,766 Method for epitaxial lift-off for oxide films utilizing superconductor release layers
Novel structures and methods utilize layered copper oxide release materials to separate oxide films from growth substrates. Generally, the method comprises the...
US-5,527,765 Superconducting YBa.sub.2 Cu.sub.3 O.sub.7-x produced at low temperatures
A high temperature superconductor and composite structure. A superconductor is disposed on a silver substrate without interdiffusion. The superconductor is...
US-5,527,764 3-arylthionouracils useful as herbicides, defoliants, and desiccants
Compounds having the structural formula ##STR1## wherein R.sub.1 is C.sub.1 -C.sub.4 alkyl, R.sub.2 is C.sub.1 -C.sub.4 alkyl or haloalkyl, R.sub.3 and...
US-5,527,763 Pyrimidine or triazine derivatives and herbicides
A herbicide containing a pyrimidine or triazine derivative of the formula (I): ##STR1## [wherein A is a furan ring, a pyrimidine ring, a 1,2,4-triazine ring...
US-5,527,762 Antidoting herbicidal 3-isoxazolidinone compounds
This invention embodies compositions comprising herbicidally effective compounds corresponding to the formula ##STR1## in which R.sub.1 and R.sub.2 are...
US-5,527,761 Antidoting herbicidal 3-isoxazolidinone compounds
This invention embodies compositions comprising herbicidally effective compounds corresponding to the formula ##STR1## in which R.sub.1 and R.sub.2 are...
US-5,527,760 Process for the protection of plant seeds and apparatus to carry out said process
An improved process for the phytoprotection of plant seeds, wherein there is simultaneously applied to the seeds, on the one hand, at least one first liquid...
US-5,527,759 Heat transfer cover films
The present invention relates to a heat transfer cover film characterized in that a specific transparent resin layer (2) is releasably provided on a substrate...
US-5,527,758 Direct thermal imaging process with improved tone reproduction
A direct thermal imaging process wherein a non-photosensitive direct thermal recording material is heated dot-wise, and said direct thermal recording material...
US-5,527,757 Recording material for direct thermal imaging
A non-photosensitive heat-sensitive recording material suited for use in direct thermal imaging by means of information-wise energized heating elements, wherein...
US-5,527,756 Catalyst assembly providing high surface area for nitric acid and/or HCN synthesis
A catalyst assembly is disclosed which comprises a plurality of foraminous wire mesh sheets disposed in intimate nested relation to each other along their broad...
US-5,527,755 Catalyst for the catalytic afterburning of exhaust gases containing carbon monoxide and/or oxidizable organic...
The invention relates to catalysts for the catalytic post-combustion of exhaust gases containing carbon monoxide and/or oxidizable organic compounds and...
US-5,527,754 Catalytic composition and process for the oxychlorination of ethylene using such a composition
Catalytic composition comprising copper chloride, magnesium chloride and caesium chloride deposited on an alumina, which may be used in particular for the...
US-5,527,753 Functionalized amine initiators for anionic polymerization
A process for the preparation of hydrocarbon solutions of monofunctional amine initiators of the following general structures: ##STR1## wherein M is defined...
US-5,527,752 Catalysts for the production of polyolefins
A catalyst precursor is provided which is useful, when combined with a cocatalyst, in the manufacture of polyolefins. The catalyst precursor is of the formula: ...
US-5,527,751 Polymerization catalyst and method for producing polyolefin or olefin block copolymer using the same
A polymerization catalyst comprising a reaction product of an organic rare earth metal compound of the formula (I), (wherein in the formula (I), Cp is a substituted...
US-5,527,750 Catalyst regeneration procedure for sulfur-sensitive catalysts
A method of regenerating a sulfur-sensitive hydrocarbon conversion catalyst by employing sulfur-contaminated heat-transfer equipment of a hydrocarbon conversion...
US-5,527,749 Dielectric ceramic composition for high frequencies and method for preparation of the same
A dielectric ceramic composition for high frequencies and a method of preparation of such composition is described. The dielectric ceramic composition...
US-5,527,748 High density zirconium diboride ceramics prepared with preceramic polymer binders
Disclosed is a method for preparing high density zirconium diboride ceramic bodies. The method entails mixing zirconium diboride powder with a preceramic...
US-5,527,747 Rapid process for the preparation of diamond articles
A rapid process for the preparation of diamond articles in which a porous, dense preform of diamond particles created by particle packing methods is subjected to...
US-5,527,746 Method for manufacturing an aluminum oxide sintered body
An aluminum oxide based sintered body and a method for manufacturing the same are disclosed. The aluminum oxide based sintered body is composed of silicon...
US-5,527,745 Method of fabricating antifuses in an integrated circuit device and resulting structure
Various improvements in the fabrication of an antifuse having silicon-amorphous silicon-metal layer structure are presented. Included are improved deposition...
US-5,527,744 Wafer method for breaking a semiconductor
A process for partially sawing the streets on semiconductor wafers. After sawing the streets can be covered by a protective material, and then the wafer...
US-5,527,743 Method for encapsulating an integrated circuit package
The present invention provides a method for fabricating an integrated circuit package, as well the resulting integrated circuit package, which retains a heatsink...
US-5,527,742 Process for coated bonding wires in high lead count packages
A transfer molded high lead count plastic semiconductor package is described. The packaged IC chip is mounted upon a suitable leadframe and the bonding pads wire...
US-5,527,741 Fabrication and structures of circuit modules with flexible interconnect layers
A method for fabricating a circuit module includes applying an outer insulative layer over a first patterned metallization layer on a first surface of a base...
US-5,527,740 Manufacturing dual sided wire bonded integrated circuit chip packages using offset wire bonds and support block...
A method is disclosed for constructing a dual-sided chip package onto a leadframe having a die pad and a set of lead fingers corresponding to the die pad....
US-5,527,739 Process for fabricating a semiconductor device having an improved metal interconnect structure
A metal interconnect structure includes copper interface layers (24, 30) located between a refractory metal via plug (28), and first and second metal...
US-5,527,738 Method for forming contacts in semiconductor devices
There is disclosed a method for forming a contact in a semiconductor device wherein a contact material is contacted with an area of a first conductive film...
US-5,527,737 Selective formation of low-density, low-dielectric-constant insulators in narrow gaps for line-to-line...
An interconnect structure and method is described herein. First, interconnect lines 14a-d are formed on a semiconductor body 10. Then, a dielectric layer 20 is...
US-5,527,736 Dimple-free tungsten etching back process
A new method of metallization using a dimple-free tungsten plug is described. Semiconductor device structures are formed in and on a semiconductor substrate. An...
US-5,527,735 Ohmic electrode of n-type semiconductor cubic boron nitride and method of producing same
N-type c-BN is a heat-resistant material with a wide band gap. Ohmic electrodes are indispensable for making semiconductor devices utilizing n-type c-BN. The...
US-5,527,734 Method of manufacturing a semiconductor device by forming pyramid shaped bumps using a stabilizer
By using an electroless metallization bath to which a stabilizer is added which suppresses the cathodic partial reaction, pyramid-shaped bumps (53) can be grown...
US-5,527,733 Impurity doping method with adsorbed diffusion source
For effecting impurity doping, a chemically active semiconductor surface is covered with an adsorption layer composed of an impurity element which forms a dopant...
US-5,527,732 Method for fabricating semiconductor laser and photo detecting arrays for wavelength division multiplexing...
The invention provides a method of fabricating two dimensional semiconductor surface emitting laser and photo detector arrays for wavelength division...
US-5,527,731 Surface treating method and apparatus therefor
A surface treating method of the invention comprises the steps of generating mixed chemical species containing an intended chemical species of ions necessary for...
US-5,527,730 Method of forming a capacitor having contact hole treated with hydrogen atoms and energy beam
An insulating film is formed on the surface of the base of a semiconductor, and a portion of the insulating film is removed to cause the surface to appear...
US-5,527,729 Method of manufacturing a capacitor having metal electrodes
On a silicon substrate, a silicon oxide layer, a first platinum layer, a dielectric film and a second platinum layer are formed, and then the second platinum...
US-5,527,728 Method of making thin oxide portions consisting of gate and tunnel oxides particularly in electrically erasable...
A method for forming thin oxide portions in electrically erasable and programmable read-only memory cells, including the use of the enhanced oxidation effect and...
US-5,527,727 Method of manufacturing split gate EEPROM cells
The present invention discloses a method of manufacturing flash EEPROM cells. An active region is defined to include a source bit line region and a drain bit...
US-5,527,726 Self-aligned thin-film transistor constructed using lift-off technique
A thin-film field-effect transistor is fabricated by forming an electrically insulative island between the source and the drain. A cap is formed on the island...
US-5,527,725 Method for fabricating a metal oxide semiconductor field effect transistor
A metal oxide semiconductor field effect transistor having an increased channel length in a limited area of a highly integrated chip where a gate electrode is...
US-5,527,724 Method to prevent latch-up and improve breakdown volatge in SOI mosfets
SOI (silicon-on-insulator) technology has been touted as a promising approach for fabricating advanced integrated circuits because of its advantage over bulk...
US-5,527,723 Method for forming a dynamic contact which can be either on or off or switched therebetween
A vertically raised transistor (10) is formed having a substrate (12). A conductive plug region (22) is selectively or epitaxially formed to vertically elevate...
US-5,527,722 Method of fabrication of a semiconductor device having high-and low-voltage MOS transistors
A semiconductor device (76) is provided with a high-voltage portion including NMOS transistor (78) and PMOS transistor (82b) and a low-voltage portion including...
US-5,527,721 Method of making FET with two reverse biased junctions in drain region
A polysilicon gate (42) of an N-channel MOSFET (40) includes a P+ doped central portion (42a), and N+ doped lateral portions (42b,42c) which face an N-type...
US-5,527,720 Method of forming a semiconductor device having a vertical insulated gate FET and a breakdown region remote...
A semiconductor device (1) includes a vertical insulated gate field effect device (2) and has a semiconductor body (3) with a first semiconductor region (4) of...
US-5,527,719 Process for making a semiconductor MOS transistor using a fluid material
A process for formation of an MOS semiconductor device having an LDD structure is disclosed, which may include the steps of: forming an active region and an...
US-5,527,718 Process for removing impurities from polycide electrode and insulating film using heat
A process for producing a semiconductor device which includes a step of drawing out the impurities contained in the electrode film and/or insulating film and...
US-5,527,717 Method of making solar cell module with improved weathering characteristics
A process for producing a solar cell module is characterized in that a grid electrode is formed having a coating comprising an epoxy resin of 20 g/m.sup.2...
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