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Patent # Description
US-1,001,4202 Device and method for aligning substrates
A device for aligning and bringing a large-area substrate into contact with a carrier substrate comprising: a substrate holding means for attaching the...
US-1,001,4201 Magnetic wafer gripper
Systems and methods are described for transferring wafers between processing steps in the fabrication of solar cells. The wafers may be processed using a...
US-1,001,4200 Gas injection device and assisting member
A gas injection device a placement portion on which a first or second container is placed, an ejection portion which is placed on the placement portion and...
US-1,001,4199 Wafer boat support table and heat treatment apparatus using the same
There is provided a wafer boat support table that supports a wafer boat having a plurality of posts from below, the plurality of posts being configured to...
US-1,001,4198 Wear detection of consumable part in semiconductor manufacturing equipment
Methods, systems, and computer programs are presented for determining wear of a consumable part in a semiconductor processing apparatus. One chamber includes a...
US-1,001,4197 Semiconductor device manufacturing method
The present invention provides a semiconductor device manufacturing method that can sense the atmospheric air leakage more precisely and that can prevent too...
US-1,001,4196 Wafer transport assembly with integrated buffers
A wafer transport assembly includes first and second wafer transport modules, and a buffer module coupled between the first and second wafer transport modules....
US-1,001,4195 Decapsulation system
A decapsulation apparatus has an etch plate, an off-center etch head having an opening, a cover sealing to the etch plate forming an etching chamber, a gasket...
US-1,001,4194 Heating device
A heating device includes a base body 2 that has a placement surface 2a for placing a wafer W thereon; a heating resistor 4 that is embedded in the base body 2;...
US-1,001,4193 Method and device for bonding substrates
A method and corresponding device for bonding a first contact surface of a first substrate to a second contact surface of a second substrate. The method...
US-1,001,4192 Apparatus for atomic layering etching
A substrate processing system having a processing chamber for etching a layer on a substrate is provided. The system includes a chuck upon which the substrate...
US-1,001,4191 Systems and methods for treating substrates with cryogenic fluid mixtures
Disclosed herein are systems and methods for treating the surface of a microelectronic substrate, and in particular, relate to an apparatus and method for...
US-1,001,4190 Liquid processing apparatus
A liquid processing apparatus for performing liquid processing with respect to a substrate using processing fluid, includes: a plurality of substrate holding...
US-1,001,4189 Ceramic package with brazing material near seal member
A ceramic package includes a ceramic substrate, a metallization layer, a first plating layer, a brazing material layer, and a seal member. The ceramic substrate...
US-1,001,4187 Cavity package with pre-molded substrate
A cavity package is set forth along with a method of manufacturing thereof. The method comprises applying a selective plating resist to a metallic substrate in...
US-1,001,4186 Substrate treatment method and substrate treatment apparatus
In accordance with an embodiment, a substrate treatment method includes bringing a first metallic film on a substrate into contact with a first liquid, mixing a...
US-1,001,4185 Selective etch of metal nitride films
Processing methods comprising oxidizing a metal nitride film to form a metal oxynitride layer and etching the metal oxynitride layer with a metal halide...
US-1,001,4184 Methods and apparatus for forming a resist array using chemical mechanical planarization
Methods, apparatus, and systems are provided for forming a resist array on a material to be patterned using chemical-mechanical planarization. The resist array...
US-1,001,4183 Method for patterning a thin film
A method for producing at least one pattern in a layer resting on a substrate, including: a) making amorphous at least one first block of an upper layer of...
US-1,001,4182 Pattern formation method
According to one embodiment, a pattern formation method includes forming a base structure including first and second guide portions each including a pinning...
US-1,001,4181 Methods of forming patterns with multiple layers for semiconductor devices
Methods of forming patterns for semiconductor devices are provided. A method may include preparing a substrate including an etch target layer on a surface of...
US-1,001,4180 Tungsten gate and method for forming
A structure and method for forming a tungsten region for a replacement metal gate (RMG). The method for forming the tungsten region may include, among other...
US-1,001,4179 Methods for forming cobalt-copper selective fill for an interconnect
Methods for processing a substrate include: (a) depositing a cobalt layer to a first thickness within a first plurality of features and a second plurality of...
US-1,001,4178 Method for differential heating of elongate nano-scaled structures
The present disclosure is related to a method of fabricating a semiconductor device involving the production of at least two non-parallel nano-scaled structures...
US-1,001,4177 Methods for processing electronic devices
Methods for making electronic devices on thin sheets bonded to carriers. A surface modification layer and associated heat treatments, may be provided on a...
US-1,001,4176 SiC substrate treatment method
Provided is a SiC substrate treatment method for, with respect to a SiC substrate (40) that has, on its surface, grooves (41), activating ions while preventing...
US-1,001,4175 Lithography using high selectivity spacers for pitch reduction
A method embodiment for patterning a semiconductor device includes patterning a dummy layer over a hard mask to form one or more dummy lines. A sidewall aligned...
US-1,001,4174 Conformal strippable carbon film for line-edge-roughness reduction for advanced patterning
Embodiments of the disclosure relate to deposition of a conformal organic material over a feature formed in a photoresist or a hardmask, to decrease the...
US-1,001,4173 Single semiconductor crystal structure having an improved structure for crystalline lattice mismatch,...
A semiconductor single crystal structure may include a substrate; a defect trapping stack disposed on the substrate; and a semiconductor single crystal disposed...
US-1,001,4172 Thin film transistor, thin film transistor substrate, display apparatus and method of manufacturing thin film...
A thin film transistor including a gate electrode; an active layer insulated from the gate electrode; a source electrode and a drain electrode that are...
US-1,001,4171 Method of manufacturing semiconductor device
Described herein is a technique capable of improving the productivity of manufacturing of a semiconductor device in a method of processing a film by repeating...
US-1,001,4170 Apparatus and method for electrodeposition of metals with the use of an ionically resistive ionically permeable...
An apparatus for electroplating metal on a semiconductor substrate with improved plating uniformity includes in one aspect: a plating chamber configured to...
US-1,001,4169 Ion focusing
The invention generally relates to apparatuses for focusing ions at or above ambient pressure and methods of use thereof. In certain embodiments, the invention...
US-1,001,4168 Ion guiding device and ion guiding method
An ion guiding device (3) and method, the ion guiding device (3) having: a group of electrode arrays distributed along an axis in space, and a power supply...
US-1,001,4167 Ion optical apparatus and mass spectrometer
An ion optical apparatus and a mass spectrometer are provided. The ion optical apparatus includes at least one planar insulating substrate which is covered with...
US-1,001,4166 Inline ion reaction device cell and method of operation
A method and apparatus for conducting ion to charged species reactions, more particularly reactions wherein the charged species is an electron, such as ECD. The...
US-1,001,4165 Radiation sensor device for high energy photons
A radiation sensor device is disclosed for use with a radiation source, capable of emitting radiation with photon energies larger than the work function of the...
US-1,001,4164 Ion beam materials processing system with grid short clearing system for gridded ion beam source
Embodiments relate to a grid short clearing system is provided for gridded ion beam sources used in industrial applications for materials processing systems...
US-1,001,4163 Application of coating materials
The invention relates to apparatus and a method for applying coatings to substrates such as, for example, a lens or electronic component. The apparatus includes...
US-1,001,4162 Plasma generation apparatus for generating toroidal plasma
An inductive-coupling plasma generation apparatus in which coupling can be made stronger and power can be used more effectively than in a conventional...
US-1,001,4161 Electrostatic chuck including embedded faraday cage for RF delivery and associated methods for operation,...
A ceramic layer is attached to a top surface of a base plate using a bond layer. The ceramic layer has a top surface configured to support a substrate. At least...
US-1,001,4160 Scanning electron microscope and method for controlling same
The scanning electron microscope includes: an electron source; a first deflector for deflecting a primary electron beam emitted from the electron source; a...
US-1,001,4159 Detector apparatus and charged particle beam system
There is provided a detector apparatus capable of detecting the position or tilt angle of a sample stage with high resolution and high reliability. The detector...
US-1,001,4158 Innovative image processing in charged particle microscopy
A method of using a charged particle microscope comprising a source; a specimen holder, for holding a specimen; an illuminator, for irradiating the specimen; a...
US-1,001,4157 Method for acquiring image and ion beam apparatus
A method for acquiring an image, in which an image of an image acquiring region is acquired by radiating an ion beam to a sample having a conducting part with a...
US-1,001,4156 Calibration method and charged particle beam system
There is provided a method capable of calibrating a sample stage easily. This method is for use in a charged particle beam system having the sample stage for...
US-1,001,4155 Microsample stage and method of manufacturing the same
A microsample stage which fixes microsamples when the microsamples are analyzed by an analyzer includes a base, and middle supports which protrude from an upper...
US-1,001,4154 Method for enabling modular part replacement within an electron microscope sample holder
An electron microscope sample holder that includes at least one capillary having a sufficient inner diameter to act as a catheter pathway that allows objects...
US-1,001,4153 Electron microscope and method of aberration measurement
There is provided an electron microscope capable of measuring aberration with high accuracy. The electron microscope (100) comprises: an electron beam source...
US-1,001,4152 Method of aberration correction and charged particle beam system
There are disclosed an aberration correction method and a charged particle beam system capable of correcting off-axis first order aberrations. The aberration...
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