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Patent # Description
US-1,007,4551 Position detection apparatus, position detection method, information processing program, and storage medium
A hypothesis testing position detection apparatus improves robustness against abnormal detection values, and achieves both high accuracy estimation and...
US-1,007,4550 Plasma stability determination method and plasma processing apparatus
A method and apparatus for determining a stability of plasma in a plasma processing apparatus for performing a plasma processing by converting into plasma a...
US-1,007,4549 Method for acquiring data indicating electrostatic capacitance
In a method for acquiring data indicating an electrostatic capacitance between a focus ring and a measuring device includes a disc-shaped base substrate, sensor...
US-1,007,4548 Chemical liquid discharge mechanism, liquid processing apparatus, chemical liquid discharge method, and storage...
Disclosed is a chemical liquid discharge mechanism. The mechanism includes: a storage portion including a chemical liquid storage space; a diluent supply port...
US-1,007,4547 Photoresist nozzle device and photoresist supply system
Embodiments of a photoresist supply system including a photoresist nozzle device are provided. The photoresist nozzle device includes a tube including a first...
US-1,007,4546 Processing liquid supplying apparatus and processing liquid supplying method
Disclosed is a processing liquid supplying apparatus. The apparatus includes: a processing liquid supply source configured to supply a processing liquid for...
US-1,007,4545 Plasma processing apparatus and plasma processing method
Disclosed is a plasma processing apparatus for performing a processing on a processing target substrate by applying of plasma of a processing gas to the...
US-1,007,4544 Developer free positive tone lithography by thermal direct write
A method for lithographic patterning of thin films. A thin film is deposited on a substrate and the film is exposed to optical energy from a focused laser to...
US-1,007,4543 High dry etch rate materials for semiconductor patterning applications
Methods and apparatuses for depositing low density spacers using atomic layer deposition for negative patterning schemes are provided herein. Methods involve...
US-1,007,4542 Substrate processing method and substrate processing apparatus
There is provided a substrate processing method which includes polishing a rear surface of a substrate before a pattern exposure such that the rear surface is...
US-1,007,4541 Deposition of smooth metal nitride films
In one aspect, methods of forming smooth ternary metal nitride films, such as Ti.sub.xW.sub.yN.sub.z films, are provided. In some embodiments, the films are...
US-1,007,4540 III-V semiconductor diode
A stacked III-V semiconductor diode having a p.sup.+ substrate with a dopant concentration of 5*10.sup.18 to 5*10.sup.20 cm.sup.-3, a layer thickness of 50-500...
US-1,007,4539 Semiconductor device, method for manufacturing semiconductor device, inverter circuit, driving device, vehicle,...
A semiconductor device according to an embodiment includes a SiC layer having a first and a second plane; a first electrode having a first region in the SiC...
US-1,007,4538 Methods for crystallizing a substrate using a plurality of laser pulses and freeze periods
Apparatus and methods of treating a substrate with an amorphous semiconductor layer, or a semiconductor layer having small crystals, to form large crystals in...
US-1,007,4537 Method of forming semiconductor structure having sets of III-V compound layers
A method of forming a semiconductor structure includes depositing a first III-V layer over a substrate. The method includes depositing a first III-V compound...
US-1,007,4536 Lattice-mismatched semiconductor structures and related methods for device fabrication
Lattice-mismatched materials having configurations that trap defects within sidewall-containing structures.
US-1,007,4535 Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
A method of manufacturing a semiconductor device includes forming a film on a substrate by performing a cycle a predetermined number of times. The cycle...
US-1,007,4534 Ultra-conformal carbon film deposition
Embodiments of the disclosure relate to deposition of a conformal carbon-based material. In one embodiment, the method comprises depositing a sacrificial...
US-1,007,4533 Structure of epitaxial wafer and method of fabricating the same
This disclosure provides an epitaxial wafer, which includes: a silicon wafer having a central area and an extremity area enclosing the central area, the...
US-1,007,4532 Semi-active antenna starting aid for HID arc tubes
A starting aid for discharge lamp arc tubes is characterized by an arc tube having a tubular body wall that longitudinally extends between first and second ends...
US-1,007,4531 IMR-MS device
Ion-molecule-reaction--mass spectrometry (IMR-MS) device, comprising an ion source, an adjacent reaction chamber and a mass spectrometer subsequent to the...
US-1,007,4530 Carbon nanotube anchor for mass spectrometer
This invention enables a sensitivity enhancement in the detection of molecular compounds. A mass spectrometry analyte support with nanotube anchors are used to...
US-1,007,4529 Device for improved detection of ions in mass spectrometry
An electron multiplier is positioned relative to at least one dynode to direct a beam of secondary particles from the at least one dynode to a collector area of...
US-1,007,4528 Data acquisition system and method for mass spectrometry
The invention provides a data acquisition system and method for detecting ions in a mass spectrometer, comprising: a detection system for detecting ions...
US-1,007,4527 Systems and methods for using variable mass selection window widths in tandem mass spectrometry
Systems and methods are used to analyze a sample using variable mass selection window widths. A tandem mass spectrometer is instructed to perform at least two...
US-1,007,4526 Systems and methods for rapidly screening samples by mass spectrometry
Systems and methods are used to rapidly screening samples. A fast sample introduction device that is non-chromatographic is instructed to supply each sample of...
US-1,007,4525 Flow through MS.sup.3 for improved selectivity
Systems and methods are provided for selecting and fragmenting a first precursor ion in an MS3 experiment. One or more first excitation parameters are...
US-1,007,4524 Plasma processing apparatus and high frequency generator
A plasma processing apparatus (11) is provided with: a processing container (12), in which processing is performed using plasma; a plasma generating mechanism...
US-1,007,4523 Polycrystalline CaF2 member, member for plasma treatment device, plasma treatment device, and method for...
A polycrystalline CaF.sub.2 member includes a combined assembly of a plurality of polycrystalline bodies made from CaF.sub.2 that are pressure bonded together.
US-1,007,4522 Systems and methods to maintain optimum stoichiometry for reactively sputtered films
The present invention relates to systems and methods for preparing reactively sputtered films. The films are generally thin transition metal oxide (TMO) films...
US-1,007,4521 Replaceable upper chamber parts of plasma processing apparatus
An upper chamber section of a plasma reaction chamber includes a ceramic window with blind bores in an upper surface for receipt of a thermal couple and a...
US-1,007,4520 Adjustment of power and frequency based on three or more states
Systems and methods for adjusting power and frequency based on three or more states are described. One of the methods includes receiving a pulsed signal having...
US-1,007,4519 Plasma processing apparatus and filter unit
Provided is a plasma processing apparatus in which an external circuit is electrically connected, via a line, to a predetermined electric member within a...
US-1,007,4518 Apparatus for controlled overshoot in a RF generator
A radio-frequency (RF) generator is provided that produces a controlled overshoot. One embodiment includes a RF power amplifier and a direct-current (DC) power...
US-1,007,4517 Plasma treatment method, plasma treatment apparatus, and semiconductor device manufacturing method
A plasma treatment method includes: creating a plasma from a mixed gas containing carbon and nitrogen to generate CN active species, and treating a surface of a...
US-1,007,4516 Charged particle beam writing apparatus and charged particle beam writing method
A charged particle beam writing apparatus includes a storage unit to store writing data of a region to be written in a target object, a first dividing unit to...
US-1,007,4515 Charged particle beam lithography method and charged particle beam lithography apparatus
According to one aspect of the present invention, a charged particle beam lithography method includes forming, such that a shape identical to a first figure...
US-1,007,4514 Apparatus and method for improved ion beam current
An apparatus may include an electrode system, the electrode system comprising a plurality of electrodes to guide an ion beam from an entrance aperture to an...
US-1,007,4513 Multi mode systems with retractable detectors
A method for evaluating a specimen includes positioning a detector in an inserted position in which a first distance between a tip of the detector and a plane...
US-1,007,4512 System and method for setting a temperature of an object within a chamber
A system that may include a chamber, a motorized system, a chuck, a controller, multiple temperature sensors and a cooling module; wherein the chuck is...
US-1,007,4511 Defect image classification apparatus
A defect image classification apparatus includes a control unit that selects images obtained from at least some detectors among a plurality of detectors,...
US-1,007,4510 Inspection system and inspection image data generation method
An inspection system includes a TDI sensor that integrates amounts of secondary charged particles or electromagnetic waves along a predetermined direction at...
US-1,007,4509 Plasmon-excited electron beam array for complementary patterning
A system for generating an electron beam array, comprising a light source, a first substrate having a plurality of plasmonic lenses mounted thereon, the...
US-1,007,4508 Low conductance self-shielding insulator for ion implantation systems
An insulator for an ion source is positioned between the apertured ground electrode and apertured suppression electrode. The insulator has an elongate body...
US-1,007,4507 Electron beam drawing apparatus and electron beam drawing method
In one embodiment, an electron beam drawing apparatus includes an electron gun including a cathode and an anode, a current control circuit controlling a total...
US-1,007,4506 Method for manufacturing electron source
A conventional method to process a tip fails to designate the dimension of the shape of the end of the tip, and so fails to obtain a tip having any desired...
US-1,007,4505 Perovskites as ultra-low work function electron emission materials
An electron emitter device is provided comprising a cathode comprising a conductive transition metal perovskite oxide comprising mobile conducting electrons...
US-1,007,4504 Liquid crystal display device, method of manufacturing the same and alignment layer composition for the liquid...
A liquid crystal display device that includes an array substrate, an opposite substrate and a liquid crystal display layer is described. The array substrate...
US-1,007,4503 Electron gun and radiation generating apparatus
The invention relates to an electron gun for generating a flat electron beam, comprising a cathode with an emission surface which is curved about a central axis...
US-1,007,4502 Overload protection device and thermal magnetic adjustable trip unit for a breaker comprising the same
An overload protection device is disclosed, characterized in that, the overload protection device comprises a first heating band (i.e., a terminal); a second...
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