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n & k Technology, Inc. -

City: Santa Clara
State/Country: CA US


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n & k Technology, Inc. ( Santa Clara, CA )
An apparatus and method for determining a physical parameter of features on a substrate by illuminating the substrate with an incident light covering an incident wavelength range .DELTA..lambda., e.g., from 190 nm to 1000 nm, where the substrate is at least semi-transparent. A response light received from the substrate and the feature is measured to obtain a response spectrum of the response light. Further, a complex-valued response due to the feature and the substrate is computed and both the response spectrum and the complex-valued response are used in determining the physical parameter. The response light is reflected light, transmitted light or a combination of the two. The complex-valued response typically includes a complex reflectance amplitude, a complex transmittance amplitude or both. The apparatus and method take into account the effects of vertical and lateral coherence length and are well suited for examining adjacent features.
An optical system for simultaneously compensating a source drift of a light source and a detector drift of a light detector includes a test location, a first beam path from the light source to the test location, a second beam path from the test location to the light detector. First and second beam paths are arranged to intersect at a beam crossing. A calibration sample having a known reflectivity is positioned at the test location and illuminated by a probe beam generated by the light source. A known response beam of the calibration sample is used for calibrating the light source and the detector. A reference sample is placed at the beam crossing and illuminated by the probe beam. In response, the reference sample sends a reference beam along the second path length, which is used for compensating the source and detector drift.